Patent Assignment
Reel/Frame 021703/0212
Assignment of Assignor's Interest
Recorded: 2008-10-14
Pages: 2
Assignors
KAMIMURA, SOU
Executed: 2008-08-28
KAWANISHI, YASUTOMO
Executed: 2008-08-28
WADA, KENJI
Executed: 2008-08-28
TSUCHIMURA, TOMOTAKA
Executed: 2008-08-28
Assignee
FUJIFILM CORPORATION
26-30, NISHIAZABU 2-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Resist Composition Containing Novel Sulfonium Compound, Pattern-Forming Method Using the Resist Composition, and Novel Sulfonium Compound