Assignment of Assignor's Interest

Recorded: 2008-10-22 Pages: 3

Assignors

HOSHI, NAOTSUGU

Executed: 2008-09-25

KOBAYASHI, NORIYUKI

Executed: 2008-10-03

Assignee

TOKYO ELECTRON LIMITED

3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN

Covered Property (1)

Plasma Etching Method and Storage Medium

Patent: 9,384,999 →

Application: 12/254,943 →

Publication: US 2009/0111275