IP Library › Assignment 021882/0673
Patent Assignment
Reel/Frame 021882/0673

Assignment of Assignor's Interest

Recorded: 2008-11-24 Pages: 4
Assignors
YEH, HSIAO-WEI
Executed: 2008-09-16
CHANG, CHING-YU
Executed: 2008-09-16
CHEN, JIAN-HONG
Executed: 2008-09-16
LIN, CHIH-AN
Executed: 2008-09-16
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
NO. 8, LI-HSIN RD. 6, SCIENCE-BASED INDUSTRIAL PARK, HSIN-CHU, 300-77, TAIWAN
Covered Property (1)
High Etch Resistant Material for Double Patterning
Patent: 8,158,335 →
Application: 12/210,737 →
Publication: US 2010/0068656