IP Library Assignment 022013/0690
Patent Assignment
Reel/Frame 022013/0690

Assignment of Assignor's Interest

Recorded: 2008-12-22 Pages: 5
Assignors
ARENA, CHANTAL
Executed: 2008-11-26
WERKHOVEN, CHRISTIAAN
Executed: 2008-11-26
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, CHEMIN DES FRANQUES, 38190 BERNIN, FRANCE
Covered Property (1)
Abatement of Reaction Gases from Gallium Nitride Deposition
Patent: 8,585,820 →
Application: 12/305,495 →
Publication: US 2009/0283029
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 4, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 027800/0911 →