IP Library › Assignment 022079/0493
Patent Assignment
Reel/Frame 022079/0493

Assignment of Assignor's Interest

Recorded: 2009-01-08 Pages: 3
Assignors
SATOU, NORIO
Executed: 2008-11-25
KOYAMA, SUSUMU
Executed: 2008-11-25
SAKAMOTO, MASASHI
Executed: 2008-11-25
OBARA, KENJI
Executed: 2008-11-25
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Pattern Defect Analysis Equipment, Pattern Defect Analysis Method and Pattern Defect Analysis Program
Patent: 8,121,393 →
Application: 12/350,783 →
Publication: US 2009/0180680
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →