IP Library › Assignment 022116/0800
Patent Assignment
Reel/Frame 022116/0800

Assignment of Assignor's Interest

Recorded: 2009-01-16 Pages: 2
Assignors
IWASAKI, MAYUKA
Executed: 2008-12-24
SHISHIDO, CHIE
Executed: 2008-12-24
TANAKA, MAKI
Executed: 2008-12-25
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU,, TOKYO, JAPAN
Covered Property (1)
Electron Microscope System and Method for Evaluating Film Thickness Reduction of Resist Patterns
Patent: 8,217,348 →
Application: 12/354,823 →
Publication: US 2009/0212211
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →