Patent Assignment
Reel/Frame 022163/0859
Assignment of Assignor's Interest
Recorded: 2009-01-27
Pages: 4
Assignors
KUWABARA, RIKIMARU
Executed: 2009-01-13
OKAMOTO, TAKAHIRO
Executed: 2009-01-13
HOSAKA, YUKIO
Executed: 2009-01-13
SHIMIZU, TAKAFUMI
Executed: 2009-01-13
WATANABE, TSUYOSHI
Executed: 2009-01-13
Assignee
JSR CORPORATION
6-10, TSUKIJI 5-CHOME, CHUO-KU, TOKYO, 1040045, JAPAN
Covered Property
(1)
Composition for Forming Polishing Layer of Chemical Mechanical Polishing Pad, Chemical Mechanical Polishing Pad and Chemical Mechanical Polishing Method