IP Library › Assignment 022179/0466
Patent Assignment
Reel/Frame 022179/0466

Assignment of Assignor's Interest

Recorded: 2009-01-30 Pages: 2
Assignor
JAISWAL, RAJNEESH
Executed: 2009-01-28
Assignee
TEXAS INSTRUMENTS INCORPORATED
P.O. BOX 655474, M/S 3999, DALLAS, TEXAS, 75265
Covered Property (1)
Use of a Biased Precoat for Reduced First Wafer Defects in High-Density Plasma Process
Patent: 7,964,517 →
Application: 12/362,320 →
Publication: US 2010/0190352