IP Library › Assignment 022324/0663
Patent Assignment
Reel/Frame 022324/0663

Assignment of Assignor's Interest

Recorded: 2009-02-27 Pages: 2
Assignor
NOZAWA, OSAMU
Executed: 2009-02-20
Assignee
HOYA CORPORATION
7-5, NAKA-OCHIAI 2-CHOME, SHINJUKU-KU, TOKYO, JAPAN
Covered Property (1)
Photomask Blank, Photomask, and Photomask Manufacturing Method
Patent: 8,283,092 →
Application: 12/394,657 →
Publication: US 2009/0226826