IP Library Assignment 022377/0591
Patent Assignment
Reel/Frame 022377/0591

Assignment of Assignor's Interest

Recorded: 2009-03-11 Pages: 2
Assignors
MIYAJIMA, MASAAKI
Executed: 2009-02-02
HOSHINO, HIROMI
Executed: 2009-02-02
TAKITA, HIROSHI
Executed: 2009-02-02
OGINO, KOZO
Executed: 2009-02-02
Assignee
FUJITSU MICROELECTRONICS LIMITED
7-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0722, JAPAN
Covered Property (1)
Preparing Data for Hybrid Exposure Using Both Electron Beam Exposure and Reticle Exposure in Lithographic Process
Patent: 8,141,009 →
Application: 12/398,664 →
Publication: US 2009/0239160
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Jul 22, 2010
From: FUJITSU MICROELECTRONICS LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 024748/0328 →
Change of Address Dec 23, 2016
From: FUJITSU SEMICONDUCTOR LIMITED
To: FUJITSU SEMICONDUCTOR LIMITED
Reel/Frame 041188/0401 →