IP Library Assignment 022497/0044
Patent Assignment
Reel/Frame 022497/0044

Assignment of Assignor's Interest

Recorded: 2009-04-02 Pages: 2
Assignors
MIYASAKA, MASAHIRO
Executed: 2008-03-24
KUMAKI, TAKASHI
Executed: 2008-03-24
Assignee
HITACHI CHEMICAL COMPANY, LTD.
1-1, NISHI-SHINJUKU 2-CHOME, SHINJUKU-KU, TOKYO, 163-0449, JAPAN
Covered Property (1)
Photosensitive Resin Composition, and, Photosensitive Element, Method for Forming Resist Pattern, Method for Manufacturing Printed Wiring Board and Method for Manufacturing Partition Wall for Plasma Display Panel Using the Composition
Patent: 8,105,759 →
Application: 11/994,990 →
Publication: US 2009/0202944
Related Assignments (3)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Mar 2, 2023
From: HITACHI CHEMICAL COMPANY, LTD.
To: SHOWA DENKO MATERIALS CO., LTD.
Reel/Frame 062917/0865 →
Change of Name Mar 3, 2023
From: SHOWA DENKO MATERIALS CO., LTD.
To: RESONAC CORPORATION
Reel/Frame 062946/0125 →
Change of Address Feb 14, 2024
From: RESONAC CORPORATION
To: RESONAC CORPORATION
Reel/Frame 066599/0037 →