IP Library › Assignment 022515/0192
Patent Assignment
Reel/Frame 022515/0192

Assignment of Assignor's Interest

Recorded: 2009-04-07 Pages: 3
Assignors
HINO, AYA
Executed: 2008-02-01
GOTOU, HIROSHI
Executed: 2008-02-01
Assignee
KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)
10-26, WAKINOHAMA-CHO 2-CHOME, CHUO-KU, KOBE-SHI, HYOGO, 651-8585, JAPAN
Covered Property (1)
Thin Film Transistor Substrate Including Source-Drain Electrodes Formed from a Nitrogen-Containing Layer or an Oxygen/Nitrogen-Containing Layer
Patent: 8,853,695 →
Application: 12/444,267 →
Publication: US 2010/0207121