Patent Assignment
Reel/Frame 022573/0061
Assignment of Assignor's Interest
Recorded: 2009-04-21
Pages: 2
Assignors
YAMANASHI, HIROMASA
Executed: 2007-02-26
FUKUDA, MUNEYUKI
Executed: 2007-02-26
TANIMOTO, SAYAKA
Executed: 2007-02-21
SOHDA, YASUNARI
Executed: 2007-03-02
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
1-24-14, NISHI SHINBASHI, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Metrology System of Fine Pattern for Process Control by Charged Particle Beam