IP Library Assignment 022638/0439
Patent Assignment
Reel/Frame 022638/0439

Assignment of Assignor's Interest

Recorded: 2009-05-05 Pages: 3
Assignors
NISHIURA, TOMOFUMI
Executed: 2008-12-24
MIYAMOTO, ATSUSHI
Executed: 2008-12-24
SHISHIDO, CHIE
Executed: 2008-12-25
SUTANI, TAKUMICHI
Executed: 2009-01-07
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHISHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property (1)
Method and Apparatus for Inspecting Defect of Pattern Formed on Semiconductor Device
Patent: 8,045,789 →
Application: 12/350,260 →
Publication: US 2009/0208090
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name and Address Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →