IP Library Assignment 022795/0016
Patent Assignment
Reel/Frame 022795/0016

Assignment of Assignor's Interest

Recorded: 2009-06-08 Pages: 4
Assignors
NEYRET, ERIC, MR.
Executed: 2009-05-26
KONONCHUK, OLEG, MR.
Executed: 2009-05-26
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES, S.A.
CHEMIN DES FRANQUES, PARC TECHNOLOGIQUE DES FONTAINES, BERNIN, 38190, FRANCE
Covered Property (1)
Process for the Transfer of a Thin Layer Formed in a Substrate with Vacancy Clusters
Patent: 8,273,636 →
Application: 12/312,017 →
Publication: US 2011/0097871
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
Change of Name Feb 28, 2012
From: S.O.I. TEC SILICON ON INSULATOR TECHNOLOGIES; CHEMIN DES FRANQUES; PARC TECHNOLOGIES DES FONTAINES; BERNIN. FRANCE 38190
To: SOITEC
Reel/Frame 028138/0895 →