Patent Assignment
Reel/Frame 023231/0679
Assignment of Assignor's Interest
Recorded: 2009-09-15
Pages: 2
Assignee
KABUSHIKI KAISHA TOSHIBA
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Development Method, Method of Manufacturing Photomask, and Method of Manufacturing Semiconductor Device