Patent Assignment
Reel/Frame 023262/0494
Assignment of Assignor's Interest
Recorded: 2009-09-14
Pages: 4
Assignors
HATAKEYAMA, JUN
Executed: 2009-08-17
FUJII, TOSHIHIKO
Executed: 2009-08-18
OGIHARA, TSUTOMU
Executed: 2009-08-18
Assignee
SHIN-ETSU CHEMICAL CO., LTD.
6-1, OHTEMACHI 2-CHOME, CHIYODA-KU, TOKYO, JAPAN
Covered Property
(1)
Method for forming resist underlayer film, patterning process using the same, and composition for the resist underlayer film