IP Library Assignment 023416/0429
Patent Assignment
Reel/Frame 023416/0429

Assignment of Assignor's Interest

Recorded: 2009-10-23 Pages: 4
Assignors
KRAUS, DIETER
Executed: 2009-09-14
EHM, DIRK HEINRICH
Executed: 2009-09-07
STEIN, THOMAS
Executed: 2009-09-08
WOELFLE, HARALD
Executed: 2009-09-15
SCHMIDT, STEFAN-WOLFGANG
Executed: 2009-09-14
Assignee
CARL ZEISS SMT AG
RUDOLF-EBER-STRASSE 2, OBERKOCHEN, 73447, GERMANY
Covered Property (1)
Method for Cleaning an Euv Lithography Device, Method for Measuring the Residual Gas Atmosphere and the Contamination and Euv Lithography Device
Patent: 7,911,598 →
Application: 12/555,620 →
Publication: US 2010/0034349
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
A Modifying Conversion Jan 18, 2011
From: CARL ZEISS SMT AG
To: CARL ZEISS SMT GMBH
Reel/Frame 025763/0367 →