Patent Assignment
Reel/Frame 023531/0519
Assignment of Assignor's Interest
Recorded: 2009-11-17
Pages: 2
Assignors
SHEU, BEN-LI
Executed: 2009-11-05
SHIM, MARTIN
Executed: 2009-11-10
KIM, JONATHAN
Executed: 2009-11-16
Assignee
LAM RESEARCH CORPORATION
4650 CUSHING PARKWAY, FREMONT, CALIFORNIA, 94538
Covered Property
(1)
Method for Reducing Line Width Roughness with Plasma Pre-Etch Treatment on Photoresist