IP Library › Assignment 023557/0520
Patent Assignment
Reel/Frame 023557/0520

Assignment of Assignor's Interest

Recorded: 2009-11-23 Pages: 4
Assignors
KAWASE, YASUHIRO
Executed: 2009-10-23
IKEMOTO, MAKOTO
Executed: 2009-10-23
ITOU, ATSUSHI
Executed: 2009-10-23
ISHIKAWA, MAKOTO
Executed: 2009-10-23
Assignee
MITSUBISHI CHEMICAL CORPORATION
14-1, SHIBA 4-CHOME, MINATO-KU, TOKYO, 108-0014, JAPAN
Covered Property (1)
Cleaning Solution for Substrate for Semiconductor Device and Process for Producing Substrate for Semiconductor Device
Patent: 8,110,534 →
Application: 12/600,545 →
Publication: US 2010/0167972
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Merger Sep 4, 2017
From: MITSUBISHI CHEMICAL CORPORATION
To: MITSUBISHI RAYON CO., LTD.
Reel/Frame 043750/0207 →
Change of Name Sep 5, 2017
From: MITSUBISHI RAYON CO., LTD.
To: MITSUBISHI CHEMICAL CORPORATION
Reel/Frame 043750/0834 →