Patent Assignment
Reel/Frame 023760/0003
Assignment of Assignor's Interest
Recorded: 2010-01-11
Pages: 3
Assignor
BIJVOET, DIRK-JAN
Executed: 2009-12-09
Assignee
ASML NETHERLANDS B.V.
DE RUN 6501, VELDHOVEN, NL-5504 DR, NETHERLANDS
Covered Property
(1)
Lithographic Apparatus and Methods for Compensating Substrate Unflatness, Determining the Effect of Patterning Device Unflatness, and Determining the Effect of Thermal Loads on a Patterning Device