Patent Assignment
Reel/Frame 023767/0981
Assignment of Assignor's Interest
Recorded: 2010-01-12
Pages: 4
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
PARC TECHNOLOGIQUE DES FONTAINES, F-38190 BERNIN, FRANCE
Covered Property
(1)
Process for Fabricating a Substrate Comprising a Deposited Buried Oxide Layer
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.