IP Library › Assignment 023888/0540
Patent Assignment
Reel/Frame 023888/0540

Assignment of Assignor's Interest

Recorded: 2010-02-03 Pages: 5
Assignors
NISHIMURA, EIICHI
Executed: 2010-01-07
SHIMIZU, YUSUKE
Executed: 2010-01-07
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Dry Etching Method for Silicon Nitride Film
Patent: 8,679,985 →
Application: 12/698,403 →
Publication: US 2010/0197143