Patent Assignment
Reel/Frame 023991/0291
Assignment of Assignor's Interest
Recorded: 2010-02-25
Pages: 4
Assignors
SHIH, PO-CHENG
Executed: 2010-02-22
WANG, KUAN-CHEN
Executed: 2010-02-22
KO, CHUNG-CHI
Executed: 2010-02-22
LIN, KENG-CHU
Executed: 2010-02-22
PENG, TAI-YEN
Executed: 2010-02-22
HSIEH, WEN-KUO
Executed: 2010-02-22
CHEN, CHIH-HAO
Executed: 2010-02-22
Assignee
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
NO. 8, LI-HSIN RD. VI, HSINCHU SCIENCE PARK, HSINCHU, 300, TAIWAN
Covered Property
(1)
Double Patterning Strategy for Contact Hole and Trench in Photolithography