IP Library Assignment 024060/0439
Patent Assignment
Reel/Frame 024060/0439

Assignment of Assignor's Interest

Recorded: 2010-03-10 Pages: 3
Assignors
DEGUENTHER, MARKUS
Executed: 2010-03-09
LAYH, MICHAEL
Executed: 2010-03-03
Assignee
CARL ZEISS SMT AG
RUDOLF-EBER-STRASSE 2, OBERKOCHEN, 73447, GERMANY
Covered Property (1)
Illumination System Having a Beam Deflection Array for Illuminating a Mask in a Microlithographic Projection Exposure Apparatus
Patent: 9,007,563 →
Application: 12/711,059 →
Publication: US 2010/0157269
Related Assignments (1)
Other recorded transfers of the patent in this record — the chain of ownership.
A Modifying Conversion Jan 18, 2011
From: CARL ZEISS SMT AG
To: CARL ZEISS SMT GMBH
Reel/Frame 025763/0367 →