IP Library › Assignment 024076/0305
Patent Assignment
Reel/Frame 024076/0305

Assignment of Assignor's Interest

Recorded: 2010-03-13 Pages: 3
Assignor
ARENA, CHANTAL
Executed: 2009-10-29
Assignee
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES, S.A.
CHEMIN DES FRANQUES, PARC TECHNOLOGIQUE DES FONTAINES, BERNIN, 38190, FRANCE
Covered Property (1)
Epitaxial Methods for Reducing Surface Dislocation Density in Semiconductor Materials
Patent: 8,178,427 →
Application: 12/721,461 →
Publication: US 2010/0244197
Related Assignments (2)
Other recorded transfers of the patent in this record — the chain of ownership.
Assignment of Assignor's Interest Mar 13, 2010
From: CLAVELIER, LAURENT; RABAROT, MARC
To: COMMISSARIAT A. L'ENERGIE ATOMIQUE
Reel/Frame 024076/0308 →
Change of Name Jul 23, 2012
From: S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES
To: SOITEC
Reel/Frame 028621/0176 →