Patent Assignment
Reel/Frame 024229/0145
Assignment of Assignor's Interest
Recorded: 2010-04-14
Pages: 2
Assignee
HITACHI HIGH-TECHNOLOGIES CORPORATION
24-14, NISHI SHIMBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Property
(1)
Vacuum Processing Apparatus and Plasma Processing Apparatus with Temperature Control Function for Wafer Stage
Related Assignments
(1)
Other recorded transfers of the patent in this record — the chain of ownership.