IP Library Assignment 024315/0932
Patent Assignment
Reel/Frame 024315/0932

Assignment of Assignor's Interest

Recorded: 2010-04-30 Pages: 4
Assignor
HAYASHI, DAISUKE
Executed: 2010-04-13
Assignee
TOKYO ELECTRON LIMITED
3-1, AKASAKA 5-CHOME, MINATO-KU, TOKYO, 107-6325, JAPAN
Covered Property (1)
Gas Flow Path Structure and Substrate Processing Apparatus
Patent: 8,623,172 →
Application: 12/749,642 →
Publication: US 2010/0243166