Assignment of Assignor's Interest

Recorded: 2010-06-15 Pages: 4

Assignors

KOUNO, DAITA

Executed: 2010-03-26

SUGIE, NORIHIKO

Executed: 2010-03-24

WAKAMATSU, GOUJI

Executed: 2010-03-24

NATSUME, NORIHIRO

Executed: 2010-03-24

NISHIMURA, YUKIO

Executed: 2010-03-24

SUGIURA, MAKOTO

Executed: 2010-03-24

Assignee

JSR CORPORATION

1-9-2, HIGASHI-SHINBASHI, MINATO-KU, TOKYO, 105-8640, JAPAN

Covered Property (1)

Composition for Forming Upper Layer Film for Immersion Exposure, Upper Layer Film for Immersion Exposure, and Method of Forming Photoresist Pattern

Patent: 8,431,332 →

Application: 12/680,200 →

Publication: US 2010/0255416

Related Assignments (2)

Other recorded transfers of the patent in this record — the chain of ownership.