Patent Assignment
Reel/Frame 075191/0149
Merger
Recorded: 2026-03-23
Pages: 224
Assignor
JSR CORPORATION
Executed: 2024-12-16
Assignee
JICC-02, CO., LTD
9-2, HIGASHI-SHINBASHI 1-CHOME, MINATO-KU, TOKYO, JAPAN
Covered Properties
(300)
Cleaning Composition for Semiconductor Substrate and Cleaning Method
Resist Pattern-Forming Method
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern, Polymer and Polymerizable Compound
Composition for Film Formation, Film, Production Method of Patterned Substrate, and Compound
Negative Resist Pattern-Forming Method, and Composition for Upper Layer Film Formation
Pattern-Forming Method, Resin, and Composition
Fluorine-Containing Polymer, Purification Method, and Radiation-Sensitive Resin Composition
Acid Diffusion Control Agent, Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Compound, and Production Method
Photosensitive Resin Composition, Method for Forming Resist Pattern, and Method for Producing Metallic Pattern
Radiation-Sensitive Composition and Pattern-Forming Method
Composition for Base, and Directed Self-Assembly Lithography Method
Composition, Method for Producing Patterned Substrate, Film and Forming Method Thereof, and Compound
Pattern-Forming Method and Composition
Composition and Method of Forming Pattern Using Composition
Cell Adhesion Inhibitor
Pattern-Forming Method and Composition for Resist Pattern-Refinement
Pattern-Forming Method
Polymer, Resin Composition and Resin Molded Product
Semiconductor Treatment Composition and Treatment Method
Block Copolymer
Semiconductor Treatment Composition and Treatment Method
Resin Composition, Resist Pattern-Forming Method and Polymer
Pattern-Forming Method and Composition
Optical Filter and Ambient Light Sensor Including Optical Filter
Resist Underlayer Film-Forming Composition, Resist Underlayer Film, Resist Underlayer Film-Forming Process, and Production Method of Patterned Substrate
Pattern-Forming Method
Resist Pattern-Forming Method
Fluorine-Containing Polymer, Purification Method, and Radiation-Sensitive Resin Composition
Pattern-Forming Method and Composition
Pattern-Forming Method
Radiation-Sensitive Resin Composition and Resist Pattern-Forming Method
Solid-State Imaging Device, Infrared-Absorbing Composition, and Flattened-Film-Forming Curable Composition
Selective Modification Method of a Base Material Surface
Liquid Crystal Element and Method of Producing the Same
Method and Composition for Selectively Modifying Base Material Surface
Liquid Crystal Device, Method for Producing Same, and Compound
Composition and Pattern-Forming Method
Optical Filter Having Low Incident Angle Dependence of Incident Light, Ambient Light Sensor, Sensor Module and Electronic Device
Composition for Film Formation, Film, Resist Underlayer Film-Forming Method, Production Method of Patterned Substrate, and Compound
Fluorine-Containing Polymer, Purification Method, and Radiation-Sensitive Resin Composition
Cleaning Composition for Semiconductor Substrate
Liquid Crystal Aligning Agent, Liquid Crystal Alignment Film, Method for Producing Same, Liquid Crystal Element and Polymer
Radiation-Sensitive Composition, Pattern-Forming Method, and Metal-Containing Resin and Production Method Thereof
Composition for Resist Underlayer Film Formation, Resist Underlayer Film and Forming Method Thereof, Production Method of Patterned Substrate, and Compound
Resin Composition and Method of Forming Resist Pattern
Liquid Crystal Alignment Agent, Liquid Crystal Alignment Film, Liquid Crystal Element, and Polymer
High-Frequency Circuit Laminate and Method for Producing Same, and B-Stage Sheet
Optical Filter and Optical Sensor Device
Liquid Crystal Aligning Agent, Liquid Crystal Alignment Film, Liquid Crystal Element and Polymer
Pattern-Forming Method
Radiation-Sensitive Composition, Pattern-Forming Method and Radiation-Sensitive Acid Generating Agent
Method and Composition for Selectively Modifying Base Material Surface
Composition for Resist Underlayer Film Formation, Resist Underlayer Film and Method for Forming the Same, and Production Method of a Patterned Substrate
Optical Filter and Ambient Light Sensor Including Optical Filter
Composition for Resist Underlayer Film Formation, Resist Underlayer Film and Formation Method Thereof, and Patterned Substrate Production Method
Method for Producing Plated Shaped Structure and Photosensitive Resin Composition for Production of Plated Shaped Structures
Pattern-Forming Method and Composition
Radiation-Sensitive Resin Composition, Onium Salt Compound and Method for Forming Resist Pattern
Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method and Acid Diffusion Control Agent
Radiation-Sensitive Resin Composition, Production Method Thereof, and Resist Pattern-Forming Method
Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Acid Diffusion Control Agent, Carboxylic Acid Salt and Carboxylic Acid
Composition for Resist Underlayer Film Formation, Resist Underlayer Film and Method for Producing Patterned Substrate
Production Method of Composition for Resist Top Coat Layer, Method of Forming Resist Pattern, Production Method of Fluorine-Containing Resin, and Method of Improving Water Repellency of Resist Top Coat Layer
Composition for Pattern Formation, and Pattern-Forming Method
Modification Method of Surface of Base, Composition, and Polymer
Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Compound, and Method of Controlling Acid Diffusion
Composition for Resist Underlayer Film Formation, Resist Underlayer Film and Forming Method Thereof, Patterned Substrate-Producing Method, and Compound
Composition for Film Formation, Film-Forming Method and Directed Self-Assembly Lithography Process
Pattern-Forming Method and Patterned Substrate
Radiation-Sensitive Composition and Resist Pattern-Forming Method
Modification Method of Substrate Surface, and Composition and Polymer
Composition, Polymer, and Method of Producing Substrate
Circuit Board
Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Compound and Method of Generating Acid
Resin Composition and Method of Forming Resist Pattern
Composition for Underlayer Film Formation, Underlayer Film for Directed Self-Assembled Film and Forming Method Thereof, and Directed Self-Assembly Lithography Process
Radiation-Sensitive Resin Composition and Resist Pattern-Forming Method
Liquid Crystal Display Device and Manufacturing Method Therefor
Composition, Film, Film-Forming Method and Patterned Substrate-Producing Method
Fluorine-Containing Polymer, Purification Method, and Radiation-Sensitive Resin Composition
Negative Resist Pattern-Forming Method, and Composition for Upper Layer Film Formation
Method and Composition for Selectively Modifying Base Material Surface
Radiation-Sensitive Resin Composition, Method for Forming Pattern, and Method for Producing Monomeric Compound
Method for Producing Film
Radiation-Sensitive Resin Composition and Method for Forming Resist Pattern
Radiation-Sensitive Composition and Pattern-Forming Method
Composition, Pattern-Forming Method, and Compound-Producing Method
Discerning Device, Cell Mass Discerning Method, and Computer Program
Radiation-Sensitive Resin Composition and Method for Forming Pattern
Radiation-Sensitive Resin Composition, Method of Forming Resist Pattern, and Compound
Liquid Crystal Display Device
Polymer, Composition, Molded Article, Cured Product and Laminate
Composition, Method of Producing Substrate, and Polymer
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern and Compound
Film-Forming Composition, Silicon-Containing Film, and Resist Pattern-Forming Method
Composition for Chemical-Mechanical Polishing and Chemical-Mechanical Polishing Method
Silica-Based Film, Method of Forming the Same, Composition for Forming Insulating Film for Semiconductor Device, Interconnect Structure, and Semiconductor Device
Process for Manufacturing Cycloolefin Addition Polymer
Positive Type Radiation-Sensitive Resin Composition
Composition for Forming Antireflection Film, Laminate, and Method for Forming Resist Pattern
Substrate for Evaluation
Process for Producing Radiation-Sensitive Resin Composition
Calixarene Compound, Process for Producing the Same, Intermediate Therefor, and Composition Thereof
Composition for Forming Antireflection Film, Layered Product, and Method of Forming Resist Pattern
Magnetic Particles Comprising an Organic Polymer Layer and Method for Producing the Same
Photosensitive Insulating Resin Composition, Cured Product Thereof and Electronic Component Comprising the Same
Structure for Cell Culture, Cell Culture Vessel, Structure with Spheroid, Vessel with Spheroid, and Manufacturing Methods Thereof
Polymer-Coated Magnetic Particles Comprising a 2,3-Hydroxypropyl Group, and Probe-Bonded Particles
Stereolithography Apparatus and Stereolithography Method
Composition for Forming Lower Layer Film and Pattern Forming Method
Novel Compound, Polymer, and Radiation-Sensitive Composition
Process for Producing Amino Acid N-Carboxyanhydride
Sulfonium Compound
Radiation-Sensitive Composition, Polymer and Monomer
Organic Polymer-Magnetic Particles and Process for Producing Same
Polycarbosilane, Method for Producing Same, Silica Composition for Coating Application, and Silica Film
Radiation-Sensitive Resin Composition
Chemical Mechanical Polishing Pad
Composition for Forming a Liquid Crystal Alignment Film, and Liquid Crystal Display Device
Upper Layer-Forming Composition and Photoresist Patterning Method
Radiation-Sensitive Resin Composition
Cyclic Olefin Addition Copolymer, Process for Production Thereof, and Retardation Film Obtained from the Copolymer
Chemical Mechanical Polishing Pad
Compound and Radiation-Sensitive Composition
Polymer and Positive-Tone Radiation-Sensitive Resin Composition
Radiation-Sensitive Resin Composition
Resist Pattern-Forming Method and Resist Pattern Miniaturizing Resin Composition
Photosensitive Insulating Resin Composition, Cured Product Thereof and Aba Block Copolymer
Radiation-Sensitive Resin Composition and Compound
Novel Compound, Polymer, and Resin Composition
Method for Producing Ruthenium Compound
Pattern Forming Method
Photosensitive Insulating Resin Composition, Hardening Product Thereof, and Circuit Board Equipped Therewith
Polymer, Radiation-Sensitive Composition, Monomer, and Method of Producing Compound
Composition for Forming Resist Lower Layer Film
Aqueous Dispersion for Chemical Mechanical Polishing and Chemical Mechanical Polishing Method for Semiconductor Device
Radiation-Sensitive Composition and Process for Producing Low-Molecular Compound for Use Therein
Polymer, Radiation-Sensitive Composition, Monomer, and Method of Producing Compound
Non-Specific Adsorption Inhibitor, Probe-Bonded Particles, and Method for Producing the Same
Radiation-Sensitive Resin Composition
Composition for Forming Upper Layer Film for Immersion Exposure, Upper Layer Film for Immersion Exposure, and Method of Forming Photoresist Pattern
Upper Layer-Forming Composition and Photoresist Patterning Method
Compound, Salt, and Radiation-Sensitive Resin Composition
Radiation-Sensitive Resin Composition and Polymer
Chemical Mechanical Polishing Aqueous Dispersion, Method of Preparing the Same, Chemical Mechanical Polishing Aqueous Dispersion Preparation Kit, and Chemical Mechanical Polishing Method
Positive-Type Radiation-Sensitive Composition, Cured Film, Interlayer Insulating Film, Method of Forming Interlayer Insulating Film, Display Device, and Siloxane Polymer for Forming Interlayer Insulating Film
Upper Layer Film Forming Composition and Method of Forming Photoresist Pattern
Composition for Forming Resist Underlayer Film and Method for Forming Pattern
Method for Forming Resist Pattern
Compound, Fluorine-Containing Polymer, Radiation-Sensitive Resin Composition and Method for Producing Compound
Radiation-Sensitive Resin Composition, Method for Forming a Resist Pattern, Compound, and Polymer
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern, Polymer and Compound
Lactone Copolymer and Radiation-Sensitive Resin Composition
Radiation-Sensitive Resin Composition, Polymer and Compound
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern and Polymer
Radiation-Sensitive Resin Composition and Resist Film Formed Using the Same
Non-Specific Adsorption Inhibitor, Probe-Bonded Particles, and Method for Producing the Same
Radiation-Sensitive Resin Composition, Monomer, Polymer, and Production Method of Radiation-Sensitive Resin Composition
Resist Lower Layer Film-Forming Composition, Polymer, Resist Lower Layer Film, Pattern-Forming Method, and Method of Producing Semiconductor Device
Resist Pattern-Forming Method
Dissociation Method and Dissociation Agent for Avidin and Biotin Derivatives
Method for Forming Resist Under Layer Film, Pattern Forming Method and Composition for Resist Under Layer Film
Novel Compound, Polymer, and Radiation-Sensitive Composition
Radiation-Sensitive Resin Composition and Compound
Fluorine-Containing Polymer, Purification Method, and Radiation-Sensitive Resin Composition
Composition for Forming Upper Layer Film for Immersion Exposure, Upper Layer Film for Immersion Exposure, and Method of Forming Photoresist Pattern
Organic Polymer Particles and Process for Producing the Same, Magnetic Particles for Diagnostics, Carboxyl Group-Containing Particles and Process for Producing the Same, and Probe-Bound Particles and Process for Producing the Same
Pattern-Forming Method
Method for Forming Pattern and Developer
Resin Composition for Forming Fine Pattern and Method for Forming Fine Pattern
Pattern Forming Method and Resist Underlayer Film-Forming Composition
Radiation-Sensitive Resin Composition
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern, Polymer and Polymerizable Compound
Radiation-Sensitive Resin Composition, Resist Pattern Formation Method, and Polymer
Radiation Sensitive Resin Composition, Method for Forming a Pattern, Polymer and Compound
Radiation-Sensitive Composition
Resist Pattern-Forming Method, and Radiation-Sensitive Resin Composition
Radiation-Sensitive Resin Composition
Photoresist Composition, Resist-Pattern Forming Method, Polymer, and Compound
Composition for Resist Underlayer Film and Process for Producing Same
Method for Forming Pattern
Polymer
Radiation-Sensitive Resin Composition, Polymer, and Method for Forming Resist Pattern
Resist Pattern-Forming Method, and Radiation-Sensitive Resin Composition
Resist Pattern-Forming Method
Surface of Base Material Being Inhibited in Non-Specific Adsorption
Resist Underlayer Film-Forming Composition
Pattern-Forming Method, Resist Underlayer Film, and Composition for Forming Resist Underlayer Film
Radiation-Sensitive Resin Composition
Radiation-Sensitive Resin Composition and Radiation-Sensitive Acid Generating Agent
Radiation-Sensitive Resin Composition
Composition for Formation of Upper Layer Film, and Method for Formation of Photoresist Pattern
Radiation-Sensitive Resin Composition
Radiation-Sensitive Resin Composition
Double Patterning Method
Multilayer Resist Process Pattern-Forming Method and Multilayer Resist Process Inorganic Film-Forming Composition
Method for Forming Resist Pattern, and Composition for Forming Resist Underlayer Film
Composition for Resist Underlayer Film and Process for Producing Same
Pattern-Forming Method
Radiation-Sensitive Resin Composition and Compound
Radiation-Sensitive Resin Composition, Polymer, and Resist Pattern-Forming Method
Developer
Resist Pattern-Forming Method
Radiation-Sensitive Composition, and Compound
Resist Underlayer Film-Forming Composition and Method for Forming Pattern
Pattern-Forming Method, and Radiation-Sensitive Composition
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern, and Polymer and Compound
Method for Pattern Formation, Method and Composition for Resist Underlayer Film Formation, and Resist Underlayer Film
Resist Pattern-Forming Method, Resist Pattern-Forming Radiation-Sensitive Resin Composition, and Resist Film
Pattern-Forming Method, and Composition for Forming Resist Underlayer Film
Composition for Forming Liquid Immersion Upper Layer Film, Resist Pattern-Forming Method, Polymer, and Compound
Method for Forming Resist Pattern and Composition for Forming Protective Film
Pattern Forming Method
Filler for Affinity Chromatography
Resin Composition, Resist Underlayer Film, Resist Underlayer Film-Forming Method and Pattern-Forming Method
Radiation-Sensitive Resin Composition
Composition for Forming Resist Underlayer Film and Pattern-Forming Method
Radiation-Sensitive Resin Composition, Compound and Producing Method of Compound
Radiation-Sensitive Resin Composition, and Radiation-Sensitive Acid Generating Agent
Radiation-Sensitive Composition and Compound
Composition for Forming Resist Underlayer Film and Pattern-Forming Method
Radiation-Sensitive Composition
Resist Composition, Resist Pattern-Forming Method, and Resist Solvent
Radiation-Sensitive Resin Composition and Pattern-Forming Method
Filler for Affinity Chromatography
Pattern-Forming Method, and Radiation-Sensitive Resin Composition
Resist Pattern-Forming Method, and Radiation-Sensitive Resin Composition
Silicon-Containing Film-Forming Composition, Silicon-Containing Film, and Pattern Forming Method
Resist Underlayer Film-Forming Composition, Pattern-Forming Method and Resist Underlayer Film
Method for Forming Pattern, and Composition for Forming Resist Underlayer Film
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern, Acid Generating Agent and Compound
Radiation-Sensitive Composition and Compound
Fluorine-Containing Polymer, Purification Method, and Radiation-Sensitive Resin Composition
Resist Pattern-Forming Method, and Radiation-Sensitive Resin Composition
Pattern-Forming Method
Composition for Forming Resist Underlayer Film, and Pattern-Forming Method
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern, and Polymer and Compound
Liquid Immersion Lithography Upper-Layer Film-Forming Composition and Photoresist Pattern-Forming Method
Photoresist Composition and Resist Pattern-Forming Method
Composition, Resist Pattern-Forming Method, Compound, Method for Production of Compound, and Polymer
Composition for Forming Resist Underlayer Film, and Pattern-Forming Method
Radiation-Sensitive Resin Composition and Compound
Cell Adhesion Inhibitor
Photoresist Composition, Resist Pattern-Forming Method, Compound, Acid Generating Agent, and Photodegradable Base
Photoresist Composition and Resist Pattern-Forming Method
Polysiloxane Composition and Pattern-Forming Method
Pattern-Forming Method, and Radiation-Sensitive Composition
Composition for Resist Pattern-Refinement, and Fine Pattern-Forming Method
Composition for Forming a Resist Underlayer Film, and Pattern-Forming Method
Composition for Film Formation, Resist Underlayer Film, and Forming Method of Resist Underlayer Film, and Pattern-Forming Method
Photosensitive Resin Composition and Method for Producing Resist Pattern
Resist Pattern-Forming Method, Substrate-Processing Method, and Photoresist Composition
Method for Forming Pattern, and Polysiloxane Composition
Carrier Polymer Particle, Process for Producing the Same, Magnetic Particle for Specific Trapping, and Process for Producing the Same
Composition for Forming Resist Underlayer Film
Method for Producing Liquid Crystal Display
Radiation-Sensitive Resin Composition, Polymer and Compound
Radiation-Sensitive Resin Composition, Polymer, Compound, and Method for Producing Compound
Photoresist Composition, Compound, and Production Method Thereof
Pattern-Forming Method
New Polymer, Surface Hydrophilizing Agent Containing Said Polymer, and Manufacturing Method for Substrate Having Hydrophilic Surface
Fluorine-Containing Polymer, Purification Method, and Radiation-Sensitive Resin Composition
Radiation-Sensitive Resin Composition, Method for Forming Resist Pattern, Polymer and Polymerizable Compound
Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Acid Generator and Compound
Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Acid Diffusion Control Agent, Compound, and Method for Producing Compound
Composition for Pattern Formation, and Pattern-Forming Method
Composition for Forming Liquid Immersion Upper Layer Film, and Polymer
Photosensitive Composition, Cured Film and Production Process Thereof, and Electronic Part
Photoresist Composition, Resist Pattern-Forming Method, Acid Diffusion Control Agent, and Compound
Base Film-Forming Composition, and Directed Self-Assembly Lithography Method
Optical Filter, and Solid-State Image Pickup Device and Camera Module Using the Optical Filter
Composition for Film Formation, Resist Underlayer Film and Forming Method Thereof, Pattern-Forming Method and Compound
Composition for Pattern Formation, and Pattern-Forming Method
Acid Diffusion Control Agent, Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Compound, and Production Method
Resist Pattern-Forming Method and Photoresist Composition
Radiation-Sensitive Resin Composition, Polymer and Method for Forming a Resist Pattern
Composition for Pattern Formation, and Pattern-Forming Method
Optical Filter, Solid-State Image Pickup Device and Camera Module
Pattern-Forming Method and Resist Underlayer Film-Forming Composition
Composition for Film Formation, Film, Production Method of Patterned Substrate, and Compound
Patent:
9,620,378 →
Application:
14/757,551 →
Red Pixel, Green Pixel and Color Filter and Display Device
Directed Self-Assembling Composition for Pattern Formation, and Pattern-Forming Method
Composition for Base, and Directed Self-Assembly Lithography Method
Composition for Forming a Resist Underlayer Film, and Pattern-Forming Method
Radiation-Sensitive Resin Composition, Resist Pattern-Forming Method, Polymer, and Method for Producing Compound
Directed Self-Assembly Composition for Pattern Formation and Pattern-Forming Method
Photoresist Composition, Compound, and Production Method Thereof
Near-Infrared Cut Filter and Device Including Near-Infrared Cut Filter
Composition for Pattern Formation, Pattern-Forming Method, and Block Copolymer
Solid-State Image Capture Element Optical Filter and Application Thereof
Radiation-Sensitive Resin Composition and Resist Pattern-Forming Method
Optical Filter, and Solid-State Image Pickup Device and Camera Module Using the Optical Filter
Optical Filter, and Solid-State Image Pickup Device and Camera Module Using the Optical Filter
Radiation-Sensitive Resin Composition and Resist Pattern-Forming Method
Pattern Forming Method
Cleaning Composition and Cleaning Method
Pattern-Forming Method and Composition
Composition for Forming Liquid Immersion Upper Layer Film, and Polymer
Method for Film Formation, and Pattern-Forming Method
Solid-State Imaging Device
Related Assignments
(11)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Sep 23, 2015
From: NAKAFUJI, SHIN-YA; TOYOKAWA, FUMIHIRO; WAKAMATSU, GOUJI; TAKIMOTO, YOSHIO
To: JSR CORPORATION
Reel/Frame 036632/0972 →
Assignment of Assignor's Interest
Feb 12, 2016
From: NAKAFUJI, SHIN-YA; WAKAMATSU, GOJI; ABE, TSUBASA; SAKAI, KAZUNORI
To: JSR CORPORATION
Reel/Frame 037725/0621 →
Assignment of Assignor's Interest
Mar 28, 2016
From: MEYA, KANAKO; ANNO, YUSUKE; MARUYAMA, KEN; MORI, SHUTO
To: JSR CORPORATION
Reel/Frame 038113/0139 →
Assignment of Assignor's Interest
Jun 23, 2016
From: FURUKAWA, TAIICHI; OSAWA, SOSUKE
To: JSR CORPORATION
Reel/Frame 038996/0983 →
Assignment of Assignor's Interest
Aug 12, 2016
From: NAKAGAWA, HISASHI; SAITOU, RYUICHI; KURITA, SHUNSUKE; SAKAI, TATSUYA
To: JSR CORPORATION
Reel/Frame 039417/0928 →
Assignment of Assignor's Interest
Aug 24, 2016
From: OSAKI, HITOSHI
To: JSR CORPORATION
Reel/Frame 039515/0801 →
Assignment of Assignor's Interest
Sep 16, 2016
From: ISHIKAWA, MASAYOSHI; TANAKA, HIROMITSU; KAWAZU, TOMOHARU; SUZUKI, JUNYA
To: JSR CORPORATION
Reel/Frame 039768/0001 →
Assignment of Assignor's Interest
Sep 16, 2016
From: AOKI, SHUN; TANAKA, HIROMITSU; WAKAMATSU, GOJI; TAKIMOTO, YOSHIO
To: JSR CORPORATION
Reel/Frame 039768/0111 →
Assignment of Assignor's Interest
Nov 30, 2016
From: AKIMARU, HISANORI; OKAMOTO, KENJI; SAKAKIBARA, HIROKAZU; KATSURAYAMA, MAKOTO
To: JSR CORPORATION
Reel/Frame 040472/0644 →
Assignment of Assignor's Interest
Feb 17, 2017
From: KASAHARA, KAZUKI
To: JSR CORPORATION
Reel/Frame 041287/0532 →
Change of Name
Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →