Pattern-forming method, and composition for forming resist underlayer film
Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid.
1. A composition for forming a resist underlayer film for use in a method for forming a pattern, comprising:
the resist underlayer film being capable of being removed with an alkali liquid,
the composition comprising a compound having an alkali-cleavable functional group, and
the alkali-cleavable functional group having a structure that generates a polar group by cleavage in an alkaline aqueous solution,
wherein the compound having an alkali-cleavable functional group has crosslinkability and is represented by the following formula (1):
wherein, Y 1 and Y 2 each independently represent a crosslinkable functional group; X represents an alkali-cleavable functional group; R 1 represents a linking group having a valency of (n1+1); R 2 represents a linking group having a valency of (n2+m); n1 is an integer of 1 to 3; n2 is an integer of 0 to 3; m is an integer of 1 to 3; wherein, n1, m and n2 satisfy the formula of: (n1×m+n2)≧2, and provided that Y 1 , Y 2 , X and R 1 are each present in plural number, the Y 1 , Y 2 , X and R 1 present in plural number may be each the same or different.
2. The composition for forming a resist underlayer film according to claim 1 , wherein the compound represented by the above formula (1) is represented by the following formula (1-1) or (1-2):
Y 11 —R 11 —X 1 —R 20 —X 2 —R 12 —Y 12 (1-1)
Y 2′ —R 20′ —X′—R 1′ —Y 1′ (1-2)
wherein, Y 11 , Y 12 , Y 1′ and Y 2′ each independently represent a monovalent group each represented by one of the following formulae (Y1) to (Y4):
in the formulae (Y1) to (Y4), A 1 and A 2 each independently represent a single bond, an alkanediyl group having 1 to 4 carbon atoms or an oxyalkanediyl group; A 3 represents a bivalent aromatic hydrocarbon group; R A represents an alkyl group having 1 to 4 carbon atoms; R B represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms; and R C represents an alkyl group having 1 to 4 carbon atoms;
X 1 , X 2 and X′ represent an ester group; R 11 , R 12 , R 1′ , R 20 and R 20′ each independently represent a phenylene group, a naphthylene group, an isopropylidenediphenylene group or an alkanediyl group having 1 to 6 carbon atoms which is unsubstituted or substituted with a fluorine atom, wherein a part or all of hydrogen atoms of the aromatic ring of the phenylene group, the naphthylene group and the isopropylidenediphenylene group are unsubstituted or substituted by an alkyl group, a cycloalkyl group, an aryl group, a halogen atom, a hydroxyl group, a cyano group or an amino group.
3. The composition for forming a resist underlayer film according to claim 1 , wherein a content of the compound having an alkali-cleavable functional group in the composition is from 1% by mass to 50% by mass with respect to a solid content of the composition.
4. The composition for forming a resist underlayer film according to claim 1 , wherein the composition further comprises a polymer not having an alkali-cleavable functional group.
5. The composition for forming a resist underlayer film according to claim 4 , wherein the polymer comprises a structural unit comprising an aromatic group or an alicyclic group.
6. The composition for forming a resist underlayer film according to claim 5 , wherein the structural unit comprises a structure unit derived from at least one hydrocarbon selected from the group consisting of acenaphthylene, naphthalene, fluorene, indene and nortricyclene.
7. The composition for forming a resist underlayer film according to claim 4 , wherein a content of the compound having an alkali-cleavable functional group with respect to 100 parts by mass of the polymer is no less than 5 parts by mass.
8. The composition for forming a resist underlayer film according to claim 4 , wherein a content of the polymer is the no less than 10% by mass with respect a solid content of the composition.
9. The composition for forming a resist underlayer film according to claim 1 , wherein the composition further comprises an organic solvent.
10. The composition for forming a resist underlayer film according to claim 1 , wherein the composition further comprises an acid generator.
11. The composition for forming a resist underlayer film according to claim 1 , wherein the composition further comprises a crosslinkable compound other than the compound having an alkali-cleavable functional group.