Process for producing radiation-sensitive resin composition
A process for producing a radiation-sensitive resin composition includes the steps of providing a filter apparatus equipped with a filter composed of a polyamide resin filter and a polyethylene resin filter connected in series, circulating a precursor composition for the radiation-sensitive resin composition in the filter apparatus so that the precursor composition is passed through the filter two or more times to thereby effect filtration with the result that foreign matter is removed from the precursor composition.
1. A process for producing a radiation-sensitive resin composition, comprising providing a filter apparatus equipped with a filter composed of a polyamide resin filter and a polyethylene resin filter connected in series, circulating a precursor composition for the radiation-sensitive resin composition, which comprises (A) a photoacid generator, (B) an alkali-insoluble or a scarcely alkali-soluble resin containing an acid-dissociable group, (C) a solvent, and (D) an acid diffusion controller, in the filter apparatus so that the precursor composition is passed through the filter two or more times to thereby effect filtration with the result that foreign matter is removed from the precursor composition.
2. The process for producing a radiation-sensitive resin composition according to claim 1 , wherein the alkali-insoluble or scarcely alkali-soluble resin containing the acid-dissociable group (B) has (b-1) a recurring unit of the following formula (1) and (b-2) at least one recurring unit selected from the group consisting of the recurring unit having the following formula (2), the recurring unit having the following formula (3), and the recurring unit having the following formula (4),
wherein, in the formula (1), R 1 represents a hydrogen atom or a methyl group, R 2 represents a monovalent organic group, excluding a group equivalent to —OR 5 in the formula (2), m is an integer from 0 to 3, n is an integer from 1 to 3, and two or more R 2 groups which may be present are either the same or different; in the formula (2), R 3 represents a hydrogen atom or a methyl group, R 4 represents a monovalent organic group, excluding a group equivalent to —OR 5 , R 5 represents a monovalent acid-dissociable group, p is an integer from 0 to 3, q is an integer from 1 to 3, and two or more R 4 or R 5 groups which may respectively be present are either the same or different; in the formula (3), R 6 represents a hydrogen atom or a methyl group, and R 7 represents a t-butyl group, a 1-methylcyclopentyl group, or a 1-ethylcyclopentyl group; and in the formula (4), R 8 and R 10 , which may be the same or different, represent hydrogen atoms or methyl groups, and R 9 represents a divalent acid-dissociable group.