IP Library Granted Patent US 10,331,031
Granted Patent B2
US 10,331,031 · App. 15/402,514 · Granted Jun 25, 2019

Resin composition, resist pattern-forming method and polymer

Inventor: Hayato Namai (Tokyo, JP)
Assignee: JSR CORPORATION
G03F7/0397C08F216/165C08F220/28C08F220/68C09D129/10C09D133/10C09D133/14G03F7/0045G03F7/0046G03F7/038G03F7/091G03F7/11G03F7/162G03F7/168G03F7/20G03F7/2004G03F7/2037G03F7/2041G03F7/32G03F7/322G03F7/38C08F2220/281C08F2220/282C08F2220/283
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Quick Facts
Patent No.
US 10,331,031
App. No.
15/402,514
Granted
Jun 25, 2019
Kind
B2
Abstract

A resin composition comprises a polymer comprising a structural unit that comprises a group represented by formula (1), and a solvent. In the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R 1 to R 4 has the fluorine atom or a group including the fluorine atom. R 5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms. * denotes a binding site to other moiety of the structural unit. The structural unit is preferably represented by any one of formulae (2-1) to (2-3). In the formulae (2-1) to (2-3), Z represents a group represented by formula (1).

Claims (22)

1. A resin composition comprising:

a solvent; and

a fluorine-containing polymer comprising a structural unit represented by at least one selected from the group consisting of formula (2-1-1), formula (2-1-2), formula (2-1-3), formula (2-1-4), formula (2-1-5), formula (2-1-7) and formula (2-1-8):

wherein R 6 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group.

2. The resin composition according to claim 1 , further comprising a radiation-sensitive acid generator.

3. The resin composition according to claim 2 , further comprising a polymer comprising a structural unit that comprises an acid-labile group, and having a lower percentage content of fluorine atoms than a percentage content of fluorine atoms of the fluorine-containing polymer.

4. A resist pattern-forming method comprising:

applying the resin composition according to claim 2 directly or indirectly on a substrate to form a resist film;

exposing the resist film; and

developing the resist film exposed.

5. A laminate structure comprising:

a resist film; and

a protective film which is a cured product of the resin composition according to claim 1 , and which is overlaid on the resist film.

6. The resin composition according to claim 1 , wherein the fluorine-containing polymer further comprises: a structural unit comprising an acid-labile group; and a structural unit comprising at least one selected from the group consisting of a lactone structure, a cyclic carbonate structure and a sultone structure.

7. The resin composition according to claim 6 , wherein an amount of the structural unit represented by at least one selected from the group consisting of formula (2-1-1), formula (2-1-2), formula (2-1-3), formula (2-1-4), formula (2-1-5), formula (2-1-7) and formula (2-1-8) in the fluorine-containing polymer with respect to total structural units constituting the fluorine-containing polymer is from 10 to 30 mol %.

8. The resin composition according to claim 1 , wherein the fluorine-containing polymer further comprises: a structural unit comprising an acid-labile group; and a structural which has a fluorine atom and which is not the structural unit comprising a group represented by formula (1):

wherein, in the formula (1), R 1 to R 4 each independently represent a hydrogen atom, a fluorine atom or a monovalent organic group having 1 to 20 carbon atoms, wherein at least one of R 1 to R 4 represents the fluorine atom or a group comprising the fluorine atom, R 5 represents a substituted or unsubstituted trivalent chain hydrocarbon group having 1 to 7 carbon atoms, and * denotes a binding site to other moiety of the structural unit.

9. The resin composition according to claim 8 , wherein an amount of the structural unit represented by at least one selected from the group consisting of formula (2-1-1), formula (2-1-2), formula (2-1-3), formula (2-1-4), formula (2-1-5), formula (2-1-7) and formula (2-1-8) in the fluorine-containing polymer with respect to total structural units constituting the fluorine-containing polymer is from 60 to 80 mol %.

10. The resin composition according to claim 1 , wherein the fluorine-containing polymer further comprises: a structural unit comprising a group having a hydroxy group at the end thereof and at least one fluorine atom or a fluorinated alkyl group on a carbon atom adjacent to the hydroxy group.

11. The resin composition according to claim 10 , wherein an amount of the structural unit represented by at least one selected from the group consisting of formula (2-1-1), formula (2-1-2), formula (2-1-3), formula (2-1-4), formula (2-1-5), formula (2-1-7) and formula (2-1-8) in the fluorine-containing polymer with respect to total structural units constituting the fluorine-containing polymer is from 35 to 60 mol %.

12. A polymer comprising a structural unit represented by at least one selected from the group consisting of formula (2-1-1), formula (2-1-2), formula (2-1-3), formula (2-1-4), formula (2-1-5), formula (2-1-7) and formula (2-1-8):

wherein R 6 represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group.

Assignments (2)
MERGER Recorded Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
CHANGE OF NAME Recorded Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →
Priority Claims (1)
JP 2013-189913 · Sep 12, 2013 · national
Continuity (3)
Division 15066436 · Mar 10, 2016
Continuation PCTJP2014073407 · Sep 4, 2014
Related Publication 20170115570A1 · Apr 27, 2017