Radiation-sensitive resin composition, compound and producing method of compound
A radiation-sensitive resin composition includes a compound shown by a following general formula (A), a solvent and a resin having an acid-labile group. Each of R 1 and R 2 independently represents a substituted or unsubstituted monovalent hydrocarbon group having 1 to 25 carbon atoms. Each of X and Z independently represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 25 carbon atoms. Y represents a single bond or the like. n represents an integer from 0 to 5.
1. A radiation-sensitive resin composition comprising:
a compound;
a solvent; and
a resin comprising an acid-labile group,
the compound being a compound shown by a compound shown by formula (A3), a compound shown by formula (A4), or a combination thereof,
wherein
each of X and Z independently represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 25 carbon atoms,
Y represents a single bond or any one of groups shown by formulas (1-1) to (1-6),
n represents an integer from 0 to 5, and
each R 5 independently represents a substituted or unsubstituted hydrocarbon group having 1 to 25 carbon atoms.
2. The radiation-sensitive resin composition according to claim 1 , wherein each of X and Z in the formulas (A3) and (A4) independently represents a substituted or unsubstituted divalent aromatic group having 1 to 25 carbon atoms.
3. The radiation-sensitive resin composition according to claim 1 , wherein Y in the formulas (A3) and (A4) represents a single bond, the group shown by the formula (1-1), or the group shown by the formula (1-6).
4. The radiation-sensitive resin composition according to claim 1 , further comprising a radiation-sensitive acid-generating agent.
5. The radiation-sensitive resin composition according to claim 4 , wherein a content of the radiation-sensitive acid-generating agent is 0.5 to 30 parts by mass based on 100 parts by mass of the resin.
6. The radiation-sensitive resin composition according to claim 1 , further comprising an acid diffusion controller.
7. The radiation-sensitive resin composition according to claim 6 , wherein the acid diffusion controller includes a photosensitive basic compound.
8. The radiation-sensitive resin composition according to claim 6 , wherein a content of the acid diffusion controller is 0.005 to 20 parts by mass based on 100parts by mass of the resin.
9. A compound shown by formula (A3) or formula (A4),
wherein
each of X and Z independently represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 25 carbon atoms,
Y represents a single bond or any one of groups shown by formulas (1-1) to (1-6),
n represents an integer from 0 to 5, and
each R 5 independently represents a substituted or unsubstituted hydrocarbon group having 1 to 25 carbon atoms.
10. The compound according to claim 9 , wherein each of X and Z in the formulas (A3) and (A4) independently represents a substituted or unsubstituted divalent aromatic group having 1 to 25 carbon atoms.
11. The compound according to claim 9 , wherein Y in the formulas (A3) and (A4) represents a single bond, the group shown by the formula (1-1), or the group shown by the formula (1-6).