Radiation-sensitive resin composition, polymer, and resist pattern-forming method
A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R 1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R 2 . R 2 represents a carbon atom. R 3 represents a methyl group or an ethyl group. R 4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R 5 . R 5 represents a carbon atom. R 6 represents a branched alkyl group having 3 or 4 carbon atoms.
1. A radiation-sensitive resin composition comprising:
a polymer component comprising, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2);
a radiation-sensitive acid generating agent; and
a nitrogen-containing compound comprising a ring structure,
wherein, in the formula (1), R 1 represents a hydrogen atom or a methyl group; Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R 2 ; R 2 represents a carbon atom; and R 3 represents a methyl group or an ethyl group, and
in the formula (2), R 4 represents a hydrogen atom or a methyl group; X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R 5 ; R 5 represents a carbon atom; and R 6 represents a branched alkyl group having 3 or 4 carbon atoms.
2. The radiation-sensitive resin composition according to claim 1 , wherein the polymer component comprises a polymer comprising the first structural unit and the second structural unit.
3. The radiation-sensitive resin composition according to claim 1 , wherein the polymer component is a mixture comprising: a polymer comprising the first structural unit and a polymer comprising the second structural unit.
4. The radiation-sensitive resin composition according to claim 1 , wherein the first structural unit is represented by a formula (1-1):
wherein, in the formula (1-1), R 1 and R 3 are as defined in the formula (1); and a is 1 or 2.
5. The radiation-sensitive resin composition according to claim 1 , wherein the second structural unit is represented by a formula (2-1):
wherein, in the formula (2-1), R 4 and R 6 are as defined in the formula (2).
6. The radiation-sensitive resin composition according to claim 1 , wherein the polymer component further comprises, in an identical polymer or different polymers, a third structural unit comprising a lactone skeleton, a fourth structural unit comprising a cyclic carbonate structure or both of the third structural unit and the fourth structural unit.
7. The radiation-sensitive resin composition according to claim 1 , wherein the nitrogen-containing compound comprises an aromatic ring structure, a nitrogen atom-containing heterocyclic structure or both of the aromatic ring structure and the nitrogen atom-containing heterocyclic structure.
8. A polymer comprising a first structural unit represented a formula (1), a second structural unit represented a formula (2) and a structural unit comprising a cyclic carbonate structure:
wherein, in the formula (1), R 1 represents a hydrogen atom or a methyl group; Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R 2 ; R 2 represents a carbon atom; and R 3 represents a methyl group or an ethyl group, and
in the formula (2), R 4 represents a hydrogen atom or a methyl group; X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R 5 ; R 5 represents a carbon atom; and R 6 represents a branched alkyl group having 3 or 4 carbon atoms.
9. A resist pattern-forming method comprising:
coating the radiation-sensitive resin composition according to claim 1 on a substrate to provide a resist coating film,
exposing the resist coating film,
heating the exposed resist coating film, and
developing the heated resist coating film.