Radiation-sensitive resin composition

1. A radiation-sensitive resin composition comprising:

a resin essentially consisting of at least one repeating unit selected from the group consisting of a repeating unit shown by a general formula (a-1a), a repeating unit shown by a general formula (a-1b), a repeating unit shown by a general formula (a-1c), a repeating unit including a lactone structure, a repeating unit shown by a general formula (a-3), a repeating unit shown by a general formula (a-4), and a repeating unit shown by a general formula (a-5);

a radiation-sensitive acid generator that comprises a compound (I) shown by a following general formula (I);

an acid diffusion controller; and

a mixed solvent that includes about 50 mass % to about 90 mass % of propylene glycol monomethyl ether acetate,

wherein R a1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; each R a2 represents an alkyl group having 1 to 10 carbon atoms, or two R a2 s are bonded to form a 3- to 10-membered unsubstituted hydrocarbon ring and R a2 other than the two R a2 s represents an alkyl group having 1 to 10 carbon atoms; and R a3 represents an alkyl group having 1 to 4 carbon atoms; and each R a4 represents an alkyl group having 1 to 4 carbon atoms,

wherein R a1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; R a5 represents a hydrogen atom or a chain hydrocarbon group having 1 to 5 carbon atoms; A represents a single bond, a divalent or trivalent chain hydrocarbon group having 1 to 30 carbon atoms, a divalent or trivalent alicyclic hydrocarbon group having 3 to 30 carbon atoms, or a divalent or trivalent aromatic hydrocarbons group having 6 to 30 carbon atoms, wherein a carbon atom included in A and a carbon atom that forms the cyclic carbonate are bonded to form a ring structure when A is a trivalent group; and n represents an integer from 2 to 4,

wherein R a1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; and R a6 represents an unsubstituted polycyclic cycloalkyl group having 7 to 20 carbon atoms,

wherein R a7 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a trifluoromethyl group, or a hydroxylmethyl group; and R a8 represents a divalent chain hydrocarbon group or a divalent cyclic hydrocarbon group,

wherein M + represents a sulfonium cation or an iodonium cation, R represents a hydrogen atom or an unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, n represents an integer from 1 to 10, and m represents an integer from 1 to 4.

2. The radiation-sensitive resin composition according to claim 1 , wherein M + represents a sulfonium cation shown by a following general formula (II) or (III), or represents an iodonium cation shown by a following general formula (IV),

wherein R 1 , R 2 , and R 3 represent a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or an alkoxycarbonyl having 2 to 11 carbon atoms,

wherein R 4 and R 5 represent a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or an alkoxycarbonyl group having 2 to 11 carbon atoms,

wherein R 6 and R 7 represent a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group having 1 to 10 carbon atoms, an alkoxy group having 1 to 10 carbon atoms, or an alkoxycarbonyl group having 2 to 11 carbon atoms.

3. The radiation-sensitive resin composition according to claim 1 , wherein the acid diffusion controller comprises a compound shown by a following general formula (C-1),

wherein R c1 represents a hydrogen atom, a monovalent chain hydrocarbon group having 1 to 20 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms, or a ring structure formed by bonding of R c1 and R c1 , and

wherein R c2 represents a hydrogen atom, a monovalent chain hydrocarbon group having 1 to 20 carbon atoms, a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or a monovalent aromatic hydrocarbon group having 6 to 20 carbon atoms.

4. The radiation-sensitive resin composition according to claim 1 , wherein R represents a hydrogen atom.