Radiation-sensitive composition and process for producing low-molecular compound for use therein
A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.
1. A radiation-sensitive composition, comprising:
(A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, provided that compound (A) is not obtained from chain growth polymerization of a monomer with an unsaturated bond;
(B) a solvent; and
(C) a radiation-sensitive acid-generator other than the low-molecular-weight compound (A),
wherein the content of the low-molecular-weight compound (A) is 80 mass % or more of 100 mass % of the total solid component, and
wherein the low-molecular-weight compound (A) is a compound shown by the following formula (1),
wherein A represents
(a) an aliphatic group having 1 to 50 carbon atoms,
(b) an aromatic group having 6 to 50 carbon atoms,
(c) an organic group consisting of said aliphatic and said aromatic group, or
(d) a group having a valence which is the sum of l+m+n and which has two or more of the (a), (b) or (c) groups;
X represents —O—, —CH 2 C(═O)—O—, —C(═O)—O—, —OC(O)O—, or —Ar 1 —O— (wherein Ar 1 represents a 1,4-phenylene group); R 1 represents an acid-dissociable group which is a substituted or unsubstituted tertiary hydrocarbon group having 4 to 12 carbon atoms or a substituted or unsubstituted acetal group; Y represents a single bond, —R 2 —, —CH 2 —C(═O)—O—R 2 —, —C(═O)—O—R 2 —, or —Ar 2 —O—R 2 — (wherein R 2 represents a substituted or unsubstituted methylene group or a substituted or unsubstituted alkylene group having 2 to 30 carbon atoms, and Ar 2 represents a substituted or unsubstituted 1,4-phenylene group); l is an integer from 1 to 4; m is an integer from 1 to 3; n is an integer from 0 to 10; Z is an organic group shown by any one of the following formulas (2) to (5) and, when m is 2 or 3, the organic groups may be either the same or different,
wherein M 1 + in the formula (2) represents a monovalent onium cation, M 2 + in the formula (3) represents a monovalent onium cation, R 3 in the formula (3) and the formula (5) represents a substituted or unsubstituted alkyl group having 1 to 15 carbon atoms or a substituted or unsubstituted aryl group having 1 to 15 carbon atoms, P in the formula (4) represents a substituted or unsubstituted alkylene group having 2 to 10 carbon atoms or a substituted or unsubstituted arylene group having 2 to 10 carbon atoms, and Q in the formula (5) represents a group shown by any one of the following formulas (6) to (8),
wherein the low-molecular-weight compound (A) is obtained by reacting a compound having a halogenated sulfonyl group and at least one of a phenolic hydroxyl group and a carboxyl group with an N-hydroxydicarboxylmide compound in the presence of a base.
2. The radiation-sensitive composition according to claim 1 , further comprising an acid diffusion controller selected from the group consisting of
wherein R 16 is independently a hydrogen atom or a substituted or unsubstituted alkyl group, aryl group, or aralkyl group; R 17 to R 21 is independently a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted alicyclic hydrocarbon group; X − represents OH − , R 22 OH − , or R 22 COO − ; and R 22 is a monovalent organic group.
3. A radiation-sensitive composition, comprising:
(A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, provided that compound (A) is not obtained from chain growth polymerization of a monomer with an unsaturated bond;
(B) a solvent; and
(C) a radiation-sensitive acid-generator other than the low-molecular-weight compound (A),
wherein the content of the low-molecular-weight compound (A) is 80 mass % or more of 100 mass % of the total solid component, and
wherein the low-molecular-weight compound (A) is a compound shown by the following formula (1),
wherein A represents
(a) an aliphatic group having 1 to 50 carbon atoms,
(b) an aromatic group having 6 to 50 carbon atoms,
(c) an organic group consisting of said aliphatic and said aromatic group, or
(d) a group having a valence which is the sum of l+m+n and which has two or more of the (a), (b) or (c) groups;
X represents —O—, —CH 2 C(═O)—O—, —C(═O)—O—, —OC(O)O—, or —Ar 1 —O— (wherein Ar 1 represents a 1,4-phenylene group); R 1 represents an acid-dissociable group which is a substituted or unsubstituted tertiary hydrocarbon group having 4 to 12 carbon atoms or a substituted or unsubstituted acetal group; Y represents a single bond, —R 2 —, —CH 2 —C(═O)—O—R 2 —, —C(═O)—O—R 2 —, or —Ar 2 —O—R 2 — (wherein R 2 represents a substituted or unsubstituted methylene group or a substituted or unsubstituted alkylene group having 2 to 30 carbon atoms, and Ar 2 represents a substituted or unsubstituted 1,4-phenylene group); l is an integer from 1 to 4; m is an integer from 1 to 3; n is an integer from 0 to 10; Z is an organic group shown by any one of the following formulas (2) to (5) and, when m is 2 or 3, the organic groups may be either the same or different,
wherein M 1 + in the formula (2) represents a monovalent onium cation, M 2 + in the formula (3) represents a monovalent onium cation, R 3 in the formula (3) and the formula (5) represents a substituted or unsubstituted alkyl group having 1 to 15 carbon atoms or a substituted or unsubstituted aryl group having 1 to 15 carbon atoms, P in the formula (4) represents a substituted or unsubstituted alkylene group having 2 to 10 carbon atoms or a substituted or unsubstituted arylene group having 2 to 10 carbon atoms, and Q in the formula (5) represents a group shown by any one of the following formulas (6) to (8),
wherein the low-molecular-weight compound (A) is obtained by reacting a compound having an N-hydroxydicarboxylmide group and at least one of a phenolic hydroxyl group and a carboxyl group with a halogenated sulfonyl compound in the presence of a base.
4. The radiation-sensitive composition according to claim 3 , further comprising an acid diffusion controller selected from the group consisting of
wherein R 16 is independently a hydrogen atom or a substituted or unsubstituted alkyl group, aryl group, or aralkyl group; R 17 to R 21 is independently a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, or a substituted or unsubstituted alicyclic hydrocarbon group; X − represents OH − , R 22 OH − , or R 22 COO − ; and R 22 is a monovalent organic group.