Radiation-sensitive resin composition and compound
A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). wherein Z − represents a monovalent anion shown by a general formula (2), M + represents a monovalent onium cation, R 1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted or unsubstantiated with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.
1. A radiation-sensitive resin composition comprising:
an acid-dissociable group-containing resin; and
a compound shown by a general formula (1),
M + Z − (1)
wherein Z − represents a monovalent anion shown by a general formula (2), and M + represents a monovalent onium cation,
wherein R 1 represents a linear or branched alkyl group having 1 to 12 carbon atoms unsubstituted or substituted with a fluorine atom, or a linear or branched alkoxy group having 1 to 12 carbon atoms, and n is 1 or 2.
2. The radiation-sensitive resin composition according to claim 1 , further comprising a photoacid generator that generates an acid having a pKa of 2 or less upon exposure to radiation.
3. The radiation-sensitive resin composition according to claim 2 , wherein the photoacid generator is a sulfonic acid generator that generates a sulfonic acid upon exposure to radiation.
4. The radiation-sensitive resin composition according to claim 1 , wherein the acid-dissociable group-containing resin comprises at least one of a repeating unit shown by a general formula (3), a repeating unit shown by a general formula (4), and a repeating unit shown by a general formula (5),
wherein R 2 represents a hydrogen atom or a methyl group, R 3 represents a hydrogen atom, a linear or branched alkyl group having 1 to 12 carbon atoms, or a linear or branched alkoxy group having 1 to 12 carbon atoms, i is an integer from 0 to 3, and j is an integer from 0 to 3,
wherein R 4 represents a hydrogen atom or a methyl group, R 5 represents a hydrogen atom, a linear or branched alkyl group having 1 to 12 carbon atoms, or a linear or branched alkoxy group having 1 to 12 carbon atoms, k is an integer from 1 to 3, and 1 is an integer from 0 to 3,
wherein R 6 represents a hydrogen atom or a methyl group, R 7 represents a hydrogen atom, a linear or branched alkyl group having 1 to 12 carbon atoms, or a linear or branched alkoxy group having 1 to 12 carbon atoms, m is an integer from 1 to 3, and n is an integer from 0 to 3.
5. The radiation-sensitive resin composition according to claim 1 , wherein the acid-dissociable group-containing resin comprises a repeating unit shown by a general formula (6),
wherein
R 8 represents a hydrogen atom, a methyl group, a trifluoromethyl group, or a hydroxymethyl group, and
each R 9 independently represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative of the monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a linear or branched alkyl group having 1 to 4 carbon atoms, and each R 9 is a same as or different from each other, or
each R 9 independently represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative of the monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a linear or branched alkyl group having 1 to 4 carbon atoms, each R 9 is a same as or different from each other, and two of R 9 bond to each other to form a divalent alicyclic hydrocarbon group or a derivative thereof together with the carbon atom bonded to R 9 .
6. The radiation-sensitive resin composition according to claim 5 , wherein the acid-dissociable group-containing resin further comprises at least one of a repeating unit shown by a general formula (L-1) and a repeating unit shown by a general formula (C-1),
wherein R r represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R L1 represents a single bond or a divalent linking group, and R Lc represents a monovalent organic group having a lactone structure,
wherein R r represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R C1 represents a single bond or a divalent linking group, and R Cc represents a monovalent organic group having a cyclic carbonate structure.
7. A compound shown by a general formula (1),
M + Z − (1)
wherein Z − represents a monovalent anion shown by a general formula (2), and M + represents a sulfonium cation or an iodonium cation,
wherein R 1 represents a linear or branched alkyl group having 1 to 12 carbon atoms substituted with a fluorine atom, and n is 1 or 2.