Multilayer resist process pattern-forming method and multilayer resist process inorganic film-forming composition

1. A multilayer resist process pattern-forming method comprising:

providing an inorganic film over a substrate, the inorganic film being provided using a composition comprising:

a compound comprising a metal compound that comprises a hydrolyzable group, a hydrolysate of a metal compound that comprises a hydrolyzable group, a hydrolysis-condensation product of a metal compound that comprises a hydrolyzable group, or a combination thereof, the compound comprising at least one metal element belonging to Group 3, Group 4, Group 5, Group 6, Group 12, or Group 13 of the Periodic Table of the Elements; and

an organic solvent;

providing a protective film on the inorganic film;

providing a resist pattern on the protective film; and

providing a pattern on the substrate by etching that utilizes the resist pattern as a mask.

2. The multilayer resist process pattern-forming method according to claim 1 , further comprising:

providing a resist underlayer film on the substrate before providing the inorganic film over the substrate,

wherein the inorganic film is provided on the resist underlayer film.

3. The multilayer resist process pattern-forming method according to claim 1 , wherein the resist pattern is provided on the protective film using a process including:

providing a resist film on the protective film using a resist composition;

exposing the resist film by applying radiation through a photomask; and

developing the exposed resist film to provide the resist pattern.

4. The multilayer resist process pattern-forming method according to claim 1 , wherein the resist pattern is provided by nanoimprint lithography.

5. The multilayer resist process pattern-forming method according to claim 1 , wherein the protective film is an organic film or a silicon-containing film.

6. The multilayer resist process pattern-forming method according to claim 5 , wherein the silicon-containing film is formed using a composition that includes a polysiloxane and an organic solvent.

7. The multilayer resist process pattern-forming method according to claim 5 , wherein the organic film has a carbon content of 45 mass % or more and less than 70 mass %.

8. The multilayer resist process pattern-forming method according to claim 5 , wherein the silicon-containing film has a silicon content of 20 mass % or more.

9. The multilayer resist process pattern-forming method according to claim 1 , wherein the protective film has a thickness of 100 nm or less.

10. The multilayer resist process pattern-forming method according to claim 1 , wherein the metal compound is a metal alkoxide, a metal carboxylate, or a metal complex.

11. The multilayer resist process pattern-forming method according to claim 10 , wherein the metal alkoxide, the metal carboxylate, or the metal complex comprises the at least one metal element belonging to Group 3, Group 4, Group 5, Group 6, Group 12, or Group 13 of the Periodic Table of the Elements.

12. The multilayer resist process pattern-forming method according to claim 10 , wherein the metal alkoxide, the metal carboxylate, or the metal complex comprises zirconium.

13. A multilayer resist process inorganic film-forming composition comprising:

a compound including a metal compound that includes a hydrolyzable group, a hydrolysate of a metal compound that includes a hydrolyzable group, a hydrolysis-condensation product of a metal compound that includes a hydrolyzable group, or a combination thereof;

an organic solvent; and

a crosslinking accelerator,

the compound including at least one metal element belonging to Group 6, Group 12, or Group 13 of the Periodic Table of the Elements in an amount of 50 mol % or more based on a total amount of a metal element and a metalloid element included in the compound.

14. The multilayer resist process inorganic film-forming composition according to claim 13 , wherein the metal compound is a metal alkoxide, a metal carboxylate, or a metal complex.

15. The multilayer resist process inorganic film-forming composition according to claim 14 , wherein the metal alkoxide, the metal carboxylate, or the metal complex comprises the at least one metal element belonging to Group 6, Group 12, or Group 13 of the Periodic Table of the Elements.

16. A multilayer resist process inorganic film-forming composition comprising:

a compound including a metal complex that includes a hydrolyzable group, a hydrolysate of the metal complex that includes a hydrolyzable group, a hydrolysis-condensation product of the metal complex that includes a hydrolyzable group, or a combination thereof; and

an organic solvent,

the compound including at least one metal element belonging to Group 3, Group 4, or Group 5 of the Periodic Table of the Elements, and a content of the at least one metal element in the compound being 50 mol % or more based on a total amount of a metal element and a metalloid element included in the compound.

17. The multilayer resist process inorganic film-forming composition according to claim 16 , wherein the metal complex comprises the at least one metal element belonging to Group 3, Group 4, or Group 5 of the Periodic Table of the Elements.

18. The multilayer resist process inorganic film-forming composition according to claim 16 , wherein the metal complex comprises zirconium.