Developer
A developer includes an organic solvent and a nitrogen-containing compound. The developer is configured to develop a resist film to form a negative resist pattern. The resist film is formed using a photoresist composition. The photoresist composition includes a polymer and a radiation-sensitive acid generator. The polymer includes a structural unit including an acid-labile group.
1. A developer comprising:
an organic solvent comprising an ester compound; and
a nitrogen-containing compound,
the developer being configured to develop a resist film to form a negative resist pattern, the resist film being formed using a photoresist composition comprising:
a polymer that includes a structural unit including an acid-labile group and produced by polymerizing a monomer having an ethylenically unsaturated bond; and
a radiation-sensitive acid generator.
2. The developer according to claim 1 , wherein the nitrogen-containing compound is a compound shown by a formula (1),
wherein R 1 and R 2 individually represent a hydrogen atom, a hydroxyl group, a formyl group, an alkoxy group, an alkoxycarbonyl group, a chain-like hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 14 carbon atoms, or a group formed by two or more of these groups, R 3 represents a hydrogen atom, a hydroxyl group, a formyl group, an alkoxy group, an alkoxycarbonyl group, an n-valent chain-like hydrocarbon group having 1 to 30 carbon atoms, an n-valent alicyclic hydrocarbon group having 3 to 30 carbon atoms, an n-valent aromatic hydrocarbon group having 6 to 14 carbon atoms, or an n-valent group formed by two or more of these groups, n is an integer equal to or larger than 1, provided that a plurality of R 1 and a plurality of R 2 may be either a same or different when n is 2 or more, and two of R 1 to R 3 optionally bond to form a cyclic structure together with the nitrogen atom bonded thereto.
3. The developer according to claim 2 , wherein the compound shown by the formula (1) is at least one compound selected by the group consisting of a mono(cyclo)alkylamine having one nitrogen atom, a di(cyclo)alkylamine having one nitrogen atom, a tri(cyclo)alkylamine having one nitrogen atom, a substituted alkylamine having one nitrogen atom, an aromatic amine having one nitrogen atom, a (cyclo)alkylamine compound having two nitrogen atoms, a (cyclo)alkylamine compound having three nitrogen atoms, a nitrogen-containing aromatic heterocyclic compound, a nitrogen-containing aliphatic heterocyclic compound, an amid group-containing compound, and a urea compound.
4. A developer comprising:
an organic solvent comprising an ether compound; and
a nitrogen-containing compound,
the developer being configured to develop a resist film to form a negative resist pattern, the resist film being formed using a photoresist composition comprising:
a polymer that includes a structural unit including an acid-labile group and produced by polymerizing a monomer having an ethylenically unsaturated bond; and
a radiation-sensitive acid generator.
5. The developer according to claim 4 , wherein the nitrogen-containing compound is a compound shown by a formula (1),
wherein R 1 and R 2 individually represent a hydrogen atom, a hydroxyl group, a formyl group, an alkoxy group, an alkoxycarbonyl group, a chain-like hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 14 carbon atoms, or a group formed by two or more of these groups, R 3 represents a hydrogen atom, a hydroxyl group, a formyl group, an alkoxy group, an alkoxycarbonyl group, an n-valent chain-like hydrocarbon group having 1 to 30 carbon atoms, an n-valent alicyclic hydrocarbon group having 3 to 30 carbon atoms, an n-valent aromatic hydrocarbon group having 6 to 14 carbon atoms, or an n-valent group formed by two or more of these groups, n is an integer equal to or larger than 1, provided that a plurality of R 1 and a plurality of R 2 may be either a same or different when n is 2 or more, and two of R 1 to R 3 optionally bond to form a cyclic structure together with the nitrogen atom bonded thereto.
6. The developer according to claim 5 , wherein the compound shown by the formula (1) is at least one compound selected by the group consisting of a mono(cyclo)alkylamine having one nitrogen atom, a di(cyclo)alkylamine having one nitrogen atom, a tri(cyclo)alkylamine having one nitrogen atom, a substituted alkylamine having one nitrogen atom, an aromatic amine having one nitrogen atom, a (cyclo)alkylamine compound having two nitrogen atoms, a (cyclo)alkylamine compound having three nitrogen atoms, a nitrogen-containing aromatic heterocyclic compound, a nitrogen-containing aliphatic heterocyclic compound, an amid group-containing compound, and a urea compound.
7. A developer comprising:
an organic solvent comprising methyl n-amyl ketone; and
a nitrogen-containing compound,
the developer being configured to develop a resist film to form a negative resist pattern, the resist film being formed using a photoresist composition comprising:
a polymer that includes a structural unit including an acid-labile group and produced by polymerizing a monomer having an ethylenically unsaturated bond; and
a radiation-sensitive acid generator.
8. The developer according to claim 7 , wherein the nitrogen-containing compound is a compound shown by a formula (1),
wherein R 1 and R 2 individually represent a hydrogen atom, a hydroxyl group, a formyl group, an alkoxy group, an alkoxycarbonyl group, a chain-like hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 14 carbon atoms, or a group formed by two or more of these groups, R 3 represents a hydrogen atom, a hydroxyl group, a formyl group, an alkoxy group, an alkoxycarbonyl group, an n-valent chain-like hydrocarbon group having 1 to 30 carbon atoms, an n-valent alicyclic hydrocarbon group having 3 to 30 carbon atoms, an n-valent aromatic hydrocarbon group having 6 to 14 carbon atoms, or an n-valent group formed by two or more of these groups, n is an integer equal to or larger than 1, provided that a plurality of R 1 and a plurality of R 2 may be either a same or different when n is 2 or more, and two of R 1 to R 3 optionally bond to form a cyclic structure together with the nitrogen atom bonded thereto.
9. The developer according to claim 8 , wherein the compound shown by the formula (1) is at least one compound selected by the group consisting of a mono(cyclo)alkylamine having one nitrogen atom, a di(cyclo)alkylamine having one nitrogen atom, a tri(cyclo)alkylamine having one nitrogen atom, a substituted alkylamine having one nitrogen atom, an aromatic amine having one nitrogen atom, a (cyclo)alkylamine compound having two nitrogen atoms, a (cyclo)alkylamine compound having three nitrogen atoms, a nitrogen-containing aromatic heterocyclic compound, a nitrogen-containing aliphatic heterocyclic compound, an amid group-containing compound, and a urea compound.