Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound
A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R 1 represents a monovalent organic group having 1 to 20 carbon atoms. R 2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R 2 is as defined in the above formula (1). X represents an electron attractive group. R 3 represents a monovalent organic group having 1 to 20 carbon atoms.
1. A radiation-sensitive resin composition comprising:
a polymer; and
an acid generating agent to generate a compound represented by formula (1-1) by irradiation with a radioactive ray:
wherein, in the formula (1-1),
R 2 represents a hydrogen atom;
X represents a carbonyloxy group; and
R 3 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, not having or having a substituent, and being monocyclic or polycyclic.
2. The radiation-sensitive resin composition according to claim 1 , wherein the acid generating agent is a sulfonium salt compound or an iodonium salt compound.
3. The radiation-sensitive resin composition according to claim 1 , wherein the substituent of the monovalent alicyclic hydrocarbon group represented by R 3 is a hydroxyl group, a thiol group, an aryl group or an alkenyl group.
4. The radiation-sensitive resin composition according to claim 1 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is a substituted or unsubstituted polycyclic alicyclic hydrocarbon group.
5. The radiation-sensitive resin composition according to claim 1 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is a substituted or unsubstituted adamantyl group.
6. The radiation-sensitive resin composition according to claim 1 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is an adamantyl group which is unsubstituted or substituted with a hydroxyl group, a thiol group, an aryl group or an alkenyl group.
7. A method for forming a resist pattern, comprising:
providing the radiation-sensitive resin composition according to claim 1 on a substrate to form a resist film;
exposing the resist film formed; and
developing the resist film exposed.
8. The method according to claim 7 , wherein the exposing step is carried out by liquid immersion lithography.
9. An acid generating agent that generates a compound represented formula (1-1):
wherein, in the formula (1-1),
R 2 represents a hydrogen atom;
X represents a carbonyloxy group; and
R 3 a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, not having or having a substituent, and being monocyclic or polycyclic.
10. The acid generating agent according to claim 9 , wherein the substituent of the monovalent alicyclic hydrocarbon group represented by R 3 is a hydroxyl group, a thiol group, an aryl group or an alkenyl group.
11. The acid generating agent according to claim 9 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is a substituted or unsubstituted polycyclic alicyclic hydrocarbon group.
12. The acid generating agent according to claim 9 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is a substituted or unsubstituted adamantyl group.
13. The acid generating agent according to claim 9 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is an adamantyl group which is unsubstituted or substituted with a hydroxyl group, a thiol group, an aryl group or an alkenyl group.
14. A compound represented by formula (1-1):
wherein, in the formula (1-1),
R 2 represents a hydrogen atom;
X represents a carbonyloxy group; and
R 3 represents a monovalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, not having or having a substituent, and being monocyclic or polycyclic.
15. The compound according to claim 14 , wherein the substituent of the monovalent alicyclic hydrocarbon group represented by R 3 is a hydroxyl group, a thiol group, an aryl group or an alkenyl group.
16. The compound according to claim 14 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is a substituted or unsubstituted polycyclic alicyclic hydrocarbon group.
17. The compound according to claim 14 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is a substituted or unsubstituted adamantyl group.
18. The compound according to claim 14 , wherein the monovalent alicyclic hydrocarbon group represented by R 3 is an adamantyl group which is unsubstituted or substituted with a hydroxyl group, a thiol group, an aryl group or an alkenyl group.