Compound and radiation-sensitive composition
A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.
1. A compound shown by the following formula (1),
wherein Rs individually represent a hydrogen atom or an acid-dissociable group having a substituted or unsubstituted cyclic structure, provided that at least one of the Rs is an acid-dissociable group having a substituted or unsubstituted cyclic structure; Xs individually represent a substituted or unsubstituted alkylene group having 1 to 8 carbon atoms; Ys individually represent a substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted alkenyl group having 2 to 10 carbon atoms, a substituted or unsubstituted alkynyl group having 2 to 10 carbon atoms, a substituted or unsubstituted aralkyl group having 7 to 10 carbon atoms, a substituted or unsubstituted alkoxy group having 1 to 10 carbon atoms, or a substituted or unsubstituted phenoxy group; and qs are individually 0 or 1, and
wherein the acid-dissociable group is a group shown by the following formula (2-1) or (2-2),
wherein, in the formula (2-1), R 1 represents a substituted or unsubstituted cycloalkyl group having 6 to 20 carbon atoms which may contain a hetero atom and n is an integer of 1 to 3, and in the formula (2-2), R 2 represents a substituted or unsubstituted cycloalkyl group having 6 to 20 carbon atoms which may contain a hetero atom and R 3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms.
2. The compound according to claim 1 which is shown by the following formula (2),
wherein Rs individually represent a hydrogen atom or the acid-dissociable group, provided that at least one of the Rs is the acid-dissociable group.
3. The compound according to claim 2 , wherein R 1 in the formula (2-1) is a 2-methyl-2-adamantyl group, a 2-ethyl-2-adamantyl group, a 1-ethylcyclopentyl group, or a 1-methylcyclopentyl group, R in the formula (2-2) is an adamantyl group, a 2-ethyl-2-adamantyl group, or a 2-methyl-2-adamantyl group, and R 3 is a hydrogen atom or a methyl group.
4. A radiation-sensitive composition comprising (a) a compound according to claim 2 , and (b) a radiation-sensitive acid generator which generates an acid upon exposure to radiation.
5. The radiation-sensitive composition according to claim 4 , wherein the radiation-sensitive acid generator (b) is at least one compound selected from the group consisting of an onium salt, a diazomethane compound, and a sulfonimide compound.
6. The radiation-sensitive composition according to claim 4 , further comprising an acid diffusion controller (c).
7. The compound according to claim 1 , wherein R 1 in the formula (2-1) is a 2-methyl-2-adamantyl group, a 2-ethyl-2-adamantyl group, a 1-ethylcyclopentyl group, or a 1-methylcyclopentyl group, R in the formula (2-2) is an adamantyl group, a 2-ethyl-2-adamantyl group, or a 2-methyl-2-adamantyl group, and R 3 is a hydrogen atom or a methyl group.
8. A radiation-sensitive composition comprising (a) a compound according to claim 1 , and (b) a radiation-sensitive acid generator which generates an acid upon exposure to radiation.
9. The radiation-sensitive composition according to claim 8 , wherein the radiation-sensitive acid generator (b) is at least one compound selected from the group consisting of an onium salt, a diazomethane compound, and a sulfonimide compound.
10. The radiation-sensitive composition according to claim 8 , further comprising an acid diffusion controller (c).