IP Library Granted Patent US 10,923,342
Granted Patent B2
US 10,923,342 · App. 16/550,695 · Granted Feb 16, 2021

Selective modification method of a base material surface

Inventors: Hitoshi Osaki (Tokyo, JP); Hiroyuki Komatsu (Tokyo, JP)
Assignee: JSR CORPORATION
H01L21/02326H01L21/0234H01L21/02175
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Quick Facts
Patent No.
US 10,923,342
App. No.
16/550,695
Granted
Feb 16, 2021
Kind
B2
Abstract

A selective modification method of a base material surface includes subjecting at least a part of a surface of a base material to at least one surface treatment selected from the group consisting of an oxidization treatment and a hydrophilization treatment. The base material includes a surface layer and includes an oxide, a nitride or an oxynitride of silicon, or a combination thereof in a first region of the surface layer. A nonphotosensitive composition is applied directly or indirectly on the surface of the base material after the surface treatment. The nonphotosensitive composition includes: a first polymer containing a nitrogen atom; and a solvent. It is preferred that the base material contains a metal in a second region which is other than the first region of the surface layer. In the surface treatment step, an O 2 plasma treatment is preferably conducted.

Claims (25)

1. A method of selectively modifying a base material surface, comprising:

applying a surface treatment at least partially to a surface of a base material comprising a surface layer that has a first region including an oxide, a nitride or an oxynitride of silicon, or a combination thereof, and a second region including a metal;

applying a nonphotosensitive composition directly or indirectly on the surface of the base material after the surface treatment, such that a coating film is formed on the first region and the second region of the surface layer; and

rinsing the base material such that a portion of the coating film formed on the first region of the surface layer remains and that a portion of the coating film formed on a second region is removed,

wherein the surface treatment includes at least one of an oxidization treatment and a hydrophilization treatment, and

the nonphotosensitive composition comprises a solvent and a first polymer comprising a tertiary amino group on a side chain, such that the first polymer selectively modifies the first region of the surface layer of the base material.

2. The method according to claim 1 , wherein the surface treatment comprises carrying out an O 2 plasma treatment.

3. The method according to claim 1 , wherein the base material includes an oxide of silicon in the first region.

4. The method according to claim 1 , wherein the base material includes SiO 2 in the first region.

5. The method according to claim 1 , wherein the tertiary amino group is one of a dimethylamino group, a diethylamino group, a dicyclopentylamino group, a dicyclohexylamino group, a diphenylamino group, a dibenzylamino group, a methylethylamino group, and a phenylmethylamino group.

6. The method according to claim 1 , wherein the tertiary amino group is a dimethylamino group.

7. The method according to claim 1 , wherein the tertiary amino group is one of a 1-pyrrolidinyl group, a 1-piperidyl group, and a 4-morpholino group.

8. The method according to claim 1 , wherein the metal is at least one of copper, iron, zinc, cobalt, aluminum, tin, tungsten, zirconium, titanium, tantalum, germanium, molybdenum, ruthenium, gold, silver, platinum, palladium, and nickel.

9. The method according to claim 1 , wherein the metal is included in a form which is one of a metal simple substance, an alloy, an electric conductive nitride, a metal oxide, a silicide.

10. The method according to claim 1 , wherein the metal is included in a form which is one of a copper simple substance, a cobalt simple substance, and a tungsten simple substance.

11. The method according to claim 1 , wherein the metal is included in a form which is one of a nickel-copper alloy, a cobalt-nickel alloy, and a gold-silver alloy.

12. The method according to claim 1 , wherein the metal is included in a form which is one of tantalum nitride, titanium nitride, iron nitride, and aluminum nitride.

13. The method according to claim 1 , wherein the metal is included in a form which is one of iron silicide and molybdenum silicide.

14. The method according to claim 1 , wherein the rinsing includes applying a rinsing agent which is one of a polyhydric alcohol partially etherated carboxylate solvent and a monohydric alcohol solvent.

15. The method according to claim 1 , wherein the rinsing includes applying a rinsing agent which is one of PEGMA and isopropanol.

16. The method according to claim 1 , wherein the solvent comprises at least one of an alcohol solvent, an ether solvent, a ketone solvent, an amide solvent, an ester solvent, and a hydrocarbon solvent.

17. The method according to claim 1 , wherein the solvent comprises an ester solvent.

18. The method according to claim 1 , wherein the solvent comprises a polyhydric alcohol partially etherated carboxylate solvent.

19. The method according to claim 1 , wherein the solvent comprises propylene glycol monomethyl ether acetate.

20. The method according to claim 1 , wherein the surface treatment is applied entirely to the surface of the base material.

Assignments (3)
MERGER Recorded Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
CHANGE OF NAME Recorded Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 26, 2019
From: OSAKI, HITOSHI; KOMATSU, HIROYUKI
To: JSR CORPORATION
Reel/Frame 050168/0595 →
Continuity (3)
Continuation PCTJP2018006463 · Feb 22, 2018
Provisional Application 62464026 · Feb 27, 2017
Related Publication 20200051813A1 · Feb 13, 2020
Cited By (1)
US 12,230,506