IP Library Granted Patent US 7,812,105
Granted Patent B2
US 7,812,105 · App. 11/914,024 · Granted Oct 12, 2010

Compound, polymer, and radiation-sensitive composition

Assignee: JSR Corporation
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Quick Facts
Patent No.
US 7,812,105
App. No.
11/914,024
Granted
Oct 12, 2010
Kind
B2
Abstract

A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R 4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the R f s represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, M m+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.

Claims (35)

1. A compound shown by the following formula (1),

wherein R 1 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, R 2 and R 3 independently represent a hydrogen atom or a substituted or unsubstituted, linear or branched alkyl group having 1 to 10 carbon atoms, M m+ represents an onium cation, m represents an integer of 1 to 3, and n represents an integer of 0 to 3.

2. A compound shown by the following formula (2),

wherein R 4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the R f groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, M m+ represents an onium cation, m represents an integer of 1 to 3, and p represents an integer of 1 to 8.

3. The compound according to claim 2 , wherein A represents a —(CO)O-A′- group, and wherein A′ represents a divalent hydrocarbon group, a divalent hydrocarbon group which contains at least one hetero atom, or a single bond.

4. A compound shown by the following formula (3),

wherein R 5 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, R 6 represents an —OR 6′ group or an —R 6′ group, wherein R 6 is represented by the following formulae (3a) or (3b), at least one of the R f groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, and q represents an integer of 1 to 8

wherein, in formula (3a), Y represents a divalent organic group and, in formula (3b), R 14 and R 15 independently represent a hydrogen atom or a monovalent organic group, or form a ring together with the carbon atom to which R 14 and R 15 bond.

5. A polymer prepared by polymerizing or copolymerizing at least one compound according to formulae (1), (2) or (3) below, wherein the polymer has a weight average molecular weight determined by gel permeation chromatography of 1,000 to 100,000,

wherein:

in formula (1), R 1 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, R 2 and R 3 independently represent a hydrogen atom or a substituted or unsubstituted, linear or branched alkyl group having 1 to 10 carbon atoms, M m+ represents an onium cation, m represents an integer of 1 to 3, and n represents an integer of 0 to 3;

in formula (2), R 4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the R f groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, M m+ represents an onium cation, m represents an integer of 1 to 3, and p represents an integer of 1 to 8;

in formula (3), R 5 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, R 6 represents an —OR 6′ group or an —R 6′ group, wherein R 6 is represented by the following formulas (3a) or (3b), at least one of the R f groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, and q represents an integer of 1 to 8

wherein, in formula (3a), Y represents a divalent organic group and, in formula (3b), R 14 and R 15 independently represent a hydrogen atom or a monovalent organic group, or form a ring together with the carbon atom to which R 14 and R 15 bond.

6. The polymer of claim 5 , wherein the polymer is prepared by copolymerizing a compound represented by the following formula (4) with the at least one compound according to formulae (1), (2) or (3),

wherein, in formula (4), R 7 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, each R 8 independently represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, or a linear or branched alkyl group having 1 to 4 carbon atoms, and (i) at least one of the R 8 groups is the alicyclic hydrocarbon group or the derivative thereof, or (ii) two of the R 8 groups form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof in combination with the carbon atom to which the two R 8 groups bond.

7. The polymer according to claim 6 , wherein the polymer is prepared by copolymerizing a monomer containing a lactone skeleton on side chains with the at least one compound according to formulae (1), (2) or (3) and the compound represented by formula (4).

8. A radiation-sensitive resin composition comprising an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali but becomes readily-soluble in alkali by the action of an acid, wherein the acid-dissociable group-containing resin is a polymer according to claim 5 .

9. A method for producing the compound according to claim 3 , comprising synthesizing the compound by a step shown by the following reaction formula,

wherein X 1 represents a halogen atom, at least one of the R f groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, R 4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, A′ represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, M m+ represents an onium cation, m represents an integer of 1 to 3, and p represents an integer of 1 to 8.

10. A polymer prepared by copolymerization of at least one compound represented by the following formulae (1), (2), or (3) and a compound represented by the following formula (4), wherein the polymer has a weight average molecular weight determined by gel permeation chromatography of 1,000 to 100,000

wherein:

in formula (1), R 1 is a methyl group, a trifluoromethyl group, or a hydrogen atom, R 2 and R 3 independently represent a hydrogen atom or a substituted or unsubstituted, linear or branched alkyl group having 1 to 10 carbon atoms, M m+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and n is an integer of 0 to 3;

in formula (2), R 4 is a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the R f groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, M m+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p represents an integer of 1 to 8;

in formula (3), R 5 is a methyl group, a trifluoromethyl group, or a hydrogen atom, R 6 indicates a monovalent organic group, at least one of the R f groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, and q is an integer of 1 to 8; and

in formula (4), R 7 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, R 8 independently represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, or a linear or branched alkyl group having 1 to 4 carbon atoms, and (i) at least one of the R 8 groups is the alicyclic hydrocarbon group or the derivative thereof, or (ii) two of the R 8 groups form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof in combination with the carbon atom to which the two R 8 groups bond.

11. The polymer according to claim 10 , wherein A in formula (2) represents a —(CO)O-A′- group, wherein A′ represents a divalent hydrocarbon group, a divalent hydrocarbon group which contains at least one hetero atom, or a single bond.

12. The polymer according to claim 10 , wherein the polymer is prepared by copolymerizing a monomer containing a lactone skeleton on side chains with the at least one compound according to formulae (1), (2) or (3) and the compound represented by formula (4).

13. A radiation-sensitive resin composition comprising an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali but becomes readily-soluble in alkali by the action of an acid, wherein the acid-dissociable group-containing resin is a polymer according to claim 10 .

14. A radiation-sensitive resin composition comprising an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali but becomes readily-soluble in alkali by the action of an acid, wherein the acid-dissociable group-containing resin is a polymer according to claim 11 .

15. A radiation-sensitive resin composition comprising an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali but becomes readily-soluble in alkali by the action of an acid, wherein the acid-dissociable group-containing resin is a polymer according to claim 12 .

16. A radiation-sensitive resin composition comprising an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali but becomes readily-soluble in alkali by the action of an acid, wherein the acid-dissociable group-containing resin is a polymer according to claim 6 .

17. A radiation-sensitive resin composition comprising an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali but becomes readily-soluble in alkali by the action of an acid, wherein the acid-dissociable group-containing resin is a polymer according to claim 7 .

18. The polymer of claim 5 , wherein A in formula (2) is a —(CO)O-A′- group, wherein A′ represents a divalent hydrocarbon group, a divalent hydrocarbon group which contains at least one hetero atom, or a single bond.

19. A radiation-sensitive resin composition comprising an acid-dissociable group-containing resin which is insoluble or scarcely soluble in alkali but becomes readily-soluble in alkali by the action of an acid, wherein the acid-dissociable group-containing resin is a polymer according to claim 18 .

Assignments (3)
MERGER Recorded Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
CHANGE OF NAME Recorded Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 29, 2008
From: NAGAI, TOMOKI; YONEDA, EIJI; EBATA, TAKUMA; KAWAKAMI, TAKANORI; SUGIURA, MAKOTO; SHIMOKAWA, TSUTOMU; SHIMIZU, MAKOTO
To: JSR CORPORATION
Reel/Frame 020579/0449 →
Priority Claims (3)
JP 2005-138351 · May 11, 2005 · national
JP 2005-150156 · May 23, 2005 · national
JP 2006-027388 · Feb 3, 2006 · national
Continuity (1)
Related Publication 20090069521A1 · Mar 12, 2009