IP Library Granted Patent US 8,026,039
Granted Patent B2
US 8,026,039 · App. 12/514,212 · Granted Sep 27, 2011

Radiation-sensitive resin composition

Assignee: JSR Corporation
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,026,039
App. No.
12/514,212
Granted
Sep 27, 2011
Kind
B2
Abstract

A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. wherein R 1 represents a hydrogen atom or the like, M + represents a specific cation, and n represents an integer from 1 to 5.

Claims (4)

1. A radiation-sensitive resin composition comprising a resin and a solvent, the resin including a repeating unit shown by the following general formula (1),

wherein R 1 represents a hydrogen atom, a fluorine atom, or an alkyl group having 1 to 3 carbon atoms, provided that some or all of the hydrogen atoms of the alkyl group may be replaced by a fluorine atom, M + represents a sulfonium cation shown by the following general formula (2) or an iodonium cation shown by the following general formula (3), and n represents an integer from 1 to 5,

wherein R 2 , R 3 , and R 4 individually represent a substituted or unsubstituted linear or branched alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or an unsubstituted monovalent heterocyclic organic group having 4 to 30 atoms, or a substituent having a ring wherein two or more of R 2 , R 3 , and R 4 are bonded via the sulfur atom,

wherein R 5 and R 6 individually represent a substituted or unsubstituted linear or branched alkyl group having 1 to 30 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or an unsubstituted monovalent heterocyclic organic group having 4 to 30 atoms, or a substituent having a ring wherein R 5 and R 6 are bonded via the iodine atom.

Assignments (3)
MERGER Recorded Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
CHANGE OF NAME Recorded Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 8, 2009
From: NAGAI, TOMOKI; EBATA, TAKUMA; SHIMIZU, MAKOTO
To: JSR CORPORATION
Reel/Frame 022658/0857 →
Priority Claims (1)
JP 2006-305843 · Nov 10, 2006 · national
Continuity (1)
Related Publication 20100040977A1 · Feb 18, 2010