Compound, salt, and radiation-sensitive resin composition
A compound has a partial structure shown by a following formula (1), wherein R 1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents an integer from 0 to 10, and m represents an integer from 1 to 4.
1. A radiation-sensitive resin composition comprising:
a compound comprising a partial structure shown by a following formula (1),
wherein R 1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents 1, and m represents 1; and
an acid-dissociable group-containing resin, wherein the resin comprises at least:
(a) a resin that is insoluble or scarcely soluble in alkali and includes a repeating unit (10) shown by the following general formula (10) and a repeating unit obtained by protecting the phenolic hydroxyl group of repeating unit (10) with the acid-dissociable group
wherein R 15 represents a hydrogen atom or a monovalent organic group, and c and d represent an integer from 1 to 3; or
(b) a resin that is insoluble or scarcely soluble in alkali and includes a repeating unit shown by the following general formula (13),
wherein R 19 represents a hydrogen atom or a methyl group, and R 20 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, or a linear or branched alkyl group having 1 to 4 carbon atoms, provided that at least one R 20 is the alicyclic hydrocarbon group or a derivative thereof, or two R 20 bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded to the two R 20 , and the remaining R 20 is a linear or branched alkyl group having 1 to 4 carbon atoms, a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof.
2. The radiation-sensitive resin composition according to claim 1 , wherein L in formula (1) is 0.
3. The radiation-sensitive resin composition according to claim 1 , further comprising a solvent comprising γ-butyrolactone.
4. A radiation-sensitive resin composition comprising:
a salt shown by a following formula (2),
wherein R 1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents 1, m represents 1, M k+ represents a k-valent cation, and k represents an integer from 1 to 4; and
an acid-dissociable group-containing resin, wherein the resin comprises at least:
a resin that is insoluble or scarcely soluble in alkali and includes a repeating unit (10) shown by the following general formula (10) and a repeating unit obtained by protecting the phenolic hydroxyl group of repeating unit (10) with the acid-dissociable group
wherein R 15 represents a hydrogen atom or a monovalent organic group, and c and d represent an integer from 1 to 3; or
(b) a resin that is insoluble or scarcely soluble in alkali and includes a repeating unit shown by the following general formula (13),
wherein R 19 represents a hydrogen atom or a methyl group, and R 20 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, or a linear or branched alkyl group having 1 to 4 carbon atoms, provided that at least one R 20 is the alicyclic hydrocarbon group or a derivative thereof, or two R 20 bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded to the two R 20 , and the remaining R 20 is a linear or branched alkyl group having 1 to 4 carbon atoms, a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof.
5. The radiation-sensitive resin composition according to claim 4 , wherein the k-valent cation in the salt comprises at least one of a sulfonium cation and iodonium cation.
6. The radiation-sensitive resin composition according to claim 4 , wherein L in formula (2) is 0.
7. The radiation-sensitive resin composition according to claim 4 , further comprising a solvent comprising γ-butyrolactone.
8. A radiation-sensitive resin composition comprising:
a compound shown by a following formula (3),
wherein R 1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, R 2 represents a substituted or unsubstituted hydrocarbon group having 1 to 8 carbon atoms, Rf represents a fluorine atom or a perfluoroalkyl group having 1 to 4 carbon atoms, L represents an integer from 0 to 4, n represents 1, and m represents 1; and
an acid-dissociable group-containing resin, wherein the resin comprises at least:
(a) a resin that is insoluble or scarcely soluble in alkali and includes a repeating unit (10) shown by the following general formula (10) and a repeating unit obtained by protecting the phenolic hydroxyl group of repeating unit (10) with the acid-dissociable group
wherein R 15 represents a hydrogen atom or a monovalent organic group, and c and d represent an integer from 1 to 3; or
(b) a resin that is insoluble or scarcely soluble in alkali and includes a repeating unit shown by the following general formula (13)
wherein R 19 represents a hydrogen atom or a methyl group, and R 20 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, a derivative thereof, or a linear or branched alkyl group having 1 to 4 carbon atoms, provided that at least one R 20 is the alicyclic hydrocarbon group or a derivative thereof, or two R 20 bond to form a divalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof together with the carbon atom that is bonded to the two R 20 , and the remaining R 20 is a linear or branched alkyl group having 1 to 4 carbon atoms, a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms, or a derivative thereof.
9. The radiation-sensitive resin composition according to claim 8 , wherein L in formula (3) is 0.
10. The radiation-sensitive resin composition according to claim 8 , further comprising a solvent comprising γ-butyrolactone.