Resist composition, resist pattern-forming method, and resist solvent
A resist composition includes a polymer that includes an acid-labile group-containing structural unit, a photoacid generator, and a solvent. The solvent includes a compound that includes a ketonic carbonyl group and an alcoholic hydroxyl group. The alcoholic hydroxyl group is preferably a tertiary alcoholic hydroxyl group. The solvent preferably further includes an alkylene glycol monoalkyl ether carboxylate.
1. A resist composition comprising:
a polymer that comprises:
an acid-labile group-containing structural unit; and
a structural unit that comprises a lactone structure, a cyclic carbonate structure, a sultone structure, or a combination thereof,
a photoacid generator; and
a solvent comprising:
a compound comprising a ketonic carbonyl group and an alcoholic hydroxyl group; and
an alkylene glycol monoalkyl ether carboxylate, a content of the compound in the solvent being from 7 mass % to 35 mass %.
2. The resist composition according to claim 1 , wherein the alcoholic hydroxyl group is a tertiary alcoholic hydroxyl group.
3. The resist composition according to claim 1 , wherein the compound is an aliphatic ketoalcohol having 4 to 10 carbon atoms.
4. The resist composition according to claim 1 , wherein the compound is an aliphatic ketoalcohol having 6 to 10 carbon atoms, the aliphatic ketoalcohol comprising a tertiary alcoholic hydroxyl group at the β-position with respect to the ketonic carbonyl group.
5. The resist composition according to claim 1 , wherein the solvent further comprises a lactone compound.
6. The resist composition according to claim 1 , wherein the resist composition further comprises a fluorine atom-containing polymer which is other than the polymer.
7. A resist pattern-forming method comprising:
forming a resist film using the resist composition according to claim 1 ;
exposing the resist film; and
developing the exposed resist film.