IP Library Granted Patent US 8,182,977
Granted Patent B2
US 8,182,977 · App. 12/729,244 · Granted May 22, 2012

Polymer and positive-tone radiation-sensitive resin composition

Assignee: JSR Corporation
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Quick Facts
Patent No.
US 8,182,977
App. No.
12/729,244
Granted
May 22, 2012
Kind
B2
Abstract

A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R 0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 2 represents an alkyl group having 1 to 4 carbon atoms, and R 3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R 3 and R 3 bonding to each other together with a carbon atom.

Claims (26)

1. A polymer comprising:

a repeating unit (a-1) shown by a following formula (a-1);

a repeating unit (a-2) shown by a following formula (a-2); and

a GPC weight average molecular weight of about 1000 to about 100,000,

wherein R 0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group,

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 2 represents an alkyl group having 1 to 4 carbon atoms, and R 3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R 3 and R 3 bonding to each other together with a carbon atom to which the R 3 and R 3 bond.

2. The polymer according to claim 1 , wherein the repeating unit (a-2) comprises at least one of a repeating unit shown by a following formula (a-21) and a repeating unit shown by a following formula (a-22),

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 2 represents an alkyl group having 1 to 4 carbon atoms, and k represents an integer from 1 to 10.

3. The polymer according to claim 1 , further comprising at least one of a repeating unit (a-3) shown by a following formula (a-3) and a repeating unit (a-4) having a lactone structure,

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, and R 4 represents a trivalent organic group.

4. The polymer according to claim 1 , wherein the repeating unit (a-1) comprises a structure shown by a following formula (a-5),

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

5. The polymer according to claim 1 , wherein a content of the repeating unit (a-1) in the polymer is about 1 to about 50 mol %.

6. A positive-tone radiation-sensitive resin composition comprising:

a polymer (A) comprising a repeating unit (a-1) shown by a following formula (a-1);

an acid generator (B); and

a solvent (D),

wherein R 0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

7. The composition according to claim 6 , wherein the polymer (A) further comprises a repeating unit (a-2) shown by a following formula (a-2),

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 2 represents an alkyl group having 1 to 4 carbon atoms, and R 3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R 3 and R 3 bonding to each other together with a carbon atom to which the R 3 and R 3 bond.

8. The composition according to claim 7 , wherein the repeating unit (a-2) comprises a repeating unit shown by a following formula (a-21) or a repeating unit shown by a following formula (a-22),

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 2 represents an alkyl group having 1 to 4 carbon atoms, and k represents an integer from 1 to 10.

9. The composition according to claim 6 , wherein the polymer (A) further comprises at least one of a repeating unit (a-3) shown by a following formula (a-3) and a repeating unit (a-4) having a lactone structure,

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, and R 4 represents a trivalent organic group.

10. The composition according to claim 6 , wherein the repeating unit (a-1) has a structure shown by a following formula (a-5),

wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group.

Assignments (3)
MERGER Recorded Mar 23, 2026
From: JSR CORPORATION
To: JICC-02, CO., LTD
Reel/Frame 075191/0149 →
CHANGE OF NAME Recorded Mar 23, 2026
From: JICC-02 CO., LTD
To: JSR CORPORATION
Reel/Frame 075192/0023 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 18, 2010
From: IKEDA, NORIHIKO; NAKASHIMA, HIROMITSU; HARADA, SAKI
To: JSR CORPORATION
Reel/Frame 024249/0351 →
Priority Claims (2)
JP 2009-69952 · Mar 23, 2009 · national
JP 2009-90246 · Apr 2, 2009 · national
Continuity (1)
Related Publication 20100239981A1 · Sep 23, 2010