Radiation-sensitive resin composition
A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). wherein R 1 , R 2 , and R 3 individually represent a linear or branched alkyl group having 1 to 4 carbon atoms, R 4 represents a hydrogen atom, a linear or branched alkyl group having 2 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, and q represents an integer from 0 to 3.
1. A radiation-sensitive resin composition comprising a resin (A2) that comprises a repeating unit shown by the following formula (1-1), a repeating unit shown by the following formula (1-2), and a repeating unit shown by the following formula (1-3), and a radiation-sensitive acid generator (B),
wherein R represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 1 , R 2 , and R 3 individually represent linear or branched alkyl groups having 1 to 4 carbon atoms, R 4 represents a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, q represents an integer from 0 to 3, R 5 represents a linear or branched alkyl group having 1 to 4 carbon atoms, R 6 and R 7 individually represent a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms, and m represents an integer from 3 to 7.
2. The radiation-sensitive resin composition according to claim 1 , wherein the content of the repeating unit shown by the formula (1-1) in the resin (A2) is 10 to 70 mol %.
3. The radiation-sensitive resin composition according to claim 1 , wherein the resin (A2) consists of the repeating unit shown by the formula (1-1), the repeating unit shown by the formula (1-2), and the repeating unit shown by the formula (1-3), and the content of the repeating unit shown by the formula (1-1) in the resin (A2) is 20 to 50 mol %.
4. The radiation-sensitive resin composition according to claim 1 , wherein R in the formula (1-1) is a hydrogen atom or a methyl group, and R 1 , R 2 , and R 3 in the formula (1-1) are methyl groups.
5. The radiation-sensitive resin composition according to any one of claims 1 to 4 , wherein the radiation-sensitive acid generator (B) comprises a compound shown by the following formula (2),
wherein R 8 represents a hydrogen atom, a hydroxyl group, a linear or branched alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted alicyclic hydrocarbon group having 4 to 12 carbon atoms, a linear or branched alkoxyl group having 1 to 10 carbon atoms, or a linear or branched alkoxycarbonyl group having 2 to 11 carbon atoms, R 9 represents a hydrogen atom or a linear or branched alkyl group having 1 to 10 carbon atoms, p represents an integer from 0 to 3, R 10 individually represent a linear or branched alkyl group having 1 to 10 carbon atoms, a substituted or unsubstituted phenyl group, or a substituted or unsubstituted naphthyl group, or bond to form a substituted or unsubstituted divalent group having 2 to 10 carbon atoms, r represents an integer from 0 to 2, and X − represents R 11 C n F 2n SO 3 − , R 11 CH 2 C n F 2n SO 3 − , or C n F 2n+1 SO 3 − (wherein R 11 represents a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 12 carbon atoms, and n represents an integer from 1 to 10).
6. The radiation-sensitive resin composition according to claim 5 , wherein the radiation-sensitive acid generator (B) is at least one compound selected from triphenylsulfonium nonafluoro-n-butanesulfonate, 1-(4-n-butoxynaphthyl)tetrahydrothiophenium tetrahydrothiophenium nonafluoro-n-butanesulfonate, and 4-cyclohexylphenyldiphenylsulfonium nonafluoro-n-butanesulfonate.
7. A radiation-sensitive resin composition comprising:
a resin (A2) that consists essentially of a repeating unit shown by the following formula (1-1), a repeating unit shown by the following formula (1-2), and a repeating unit shown by the following formula (1-3), and
a radiation-sensitive acid generator (B),
wherein R represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R 1 , R 2 , and R 3 individually represent linear or branched alkyl groups having 1 to 4 carbon atoms, R 4 represents a hydrogen atom, a linear or branched alkyl group having 1 to 4 carbon atoms, a linear or branched fluoroalkyl group having 1 to 4 carbon atoms, or a linear or branched alkoxy group having 1 to 4 carbon atoms, q represents an integer from 0 to 3, R 5 represents a linear or branched alkyl group having 1 to 4 carbon atoms, R 6 and R 7 individually represent a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms, and m represents an integer from 3 to 7.