Radiation-sensitive resin composition
The radiation-sensitive resin composition includes a compound represented by a following formula (1), and a resin. The resin has an acid-dissociable group, is insoluble or hardly soluble in an alkali, and turns to be soluble in an alkali when the acid-dissociable group is dissociated. R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms, R 1 represents a hydrocarbon group having 1 to 20 carbon atoms or the like, R 2 to R 5 each independently represent an alkyl group having 1 to 4 carbon atoms, an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or the like, and R 6 represents a halogen atom or the like.
1. A radiation-sensitive resin composition comprising:
a compound represented by a following formula (1);
a resin component comprising:
a base resin having an acid-dissociable group, being insoluble or hardly soluble in an alkali, and being soluble in an alkali in a state where the acid-dissociable group is dissociated; and
optionally, a radiation sensitive acid generator which is at least one selected from the group consisting of an onium salt, an organic halogen compound, and a sulfone compound,
wherein, in the formula (1),
R represents a hydrogen atom or a hydrocarbon group having 1 to 20 carbon atoms,
R 1 represents a hydrocarbon group having 1 to 20 carbon atoms, and optionally an ester bond or an ether bond is included in a skeleton chain of the hydrocarbon group,
R 2 to R 5 each independently represent an alkyl group having 1 to 4 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms,
R 6 represents a halogen atom or a hydrocarbon group having 1 to 6 carbon atoms,
n is an integer of 0 to 4, and
in a case where n is an integer of 2 to 4, R 6 present in a plurality of numbers are each a same or different.
2. The radiation-sensitive resin composition according to claim 1 , wherein R in the formula (1) represents a hydrogen atom, and n is 0.
3. The radiation-sensitive resin composition according to claim 1 , wherein each of R 2 to R 5 in the formula (1) represents a methyl group.
4. The radiation-sensitive resin composition according to claim 1 , wherein the base resin has a structure unit (I) represented by a following formula (2),
wherein, in the formula (2),
R 7 represents a hydrogen atom or a methyl group, and
R 8 to R 10 each independently represent an alkyl group having 1 to 4 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms, or
R 8 represents an alkyl group having 1 to 4 carbon atoms or an alicyclic hydrocarbon group having 4 to 20 carbon atoms, and R 9 and R 10 bind with each other to form a bivalent alicyclic hydrocarbon group having 4 to 20 carbon atoms together with the carbon atom to which R 9 and R 10 are bound.